Influence of magnetic field on power deposition in high magnetic field helicon experiment

Based on high magnetic field helicon experiment(HMHX), HELIC code was used to study the effect of different magnetic fields on the power deposition under parabolic distribution. This paper is divided into three parts: preliminary calculation, actual discharge experiment and calculation. The results of preliminary calculation show that a magnetic field that is too small or too large cannot produce a good power deposition effect. When the magnetic field strength is 1200 Gs,a better power deposition can be obtained. The actual discharge experiment illustrates that the change of the magnetic field will have a certain influence on the discharge phenomenon. Finally, the results of verification calculation successfully verify the accuracy of the results of preliminary simulation. The results show that in the actual discharge experiment, it can achieve the best deposition effect when the magnetic field is 1185 Gs.

Effects of power on ion behaviors in radio-frequency magnetron sputtering of indium tin oxide(ITO)

This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,attributed to heightened plasma potential and initial emergent energy.Simultaneously,the positive ion flux escalates owing to amplified sputtering rates and electron density.Conversely,negative ions exhibit broad ion energy distribution functions(IEDFs)characterized by multiple peaks.These patterns are clarified by a combination of radiofrequency oscillation of cathode voltage and plasma potential,alongside ion transport time.This elucidation finds validation in a one-dimensional model encompassing the initial ion energy.At higher RF power,negative ions surpassing 100 e V escalate in both flux and energy,posing a potential risk of sputtering damages to ITO layers.

The effect of nitrogen concentration on the properties of N-DLC prepared by helicon wave plasma chemical vapor deposition

Nitrogen-doped diamond-like carbon(N-DLC)films were synthesized by helicon wave plasma chemical vapor deposition(HWP-CVD).The mechanism of the plasma influence on the N-DLC structure and properties was revealed by the diagnosis of plasma.The effects of nitrogen doping on the mechanical and hydrophobicity properties of DLC films were studied.The change in the ratio of precursor gas flow reduces the concentration of film-forming groups,resulting in a decrease of growth rate with increasing nitrogen flow rate.The morphology and structure of N-DLC films were characterized by scanning probe microscopy,Raman spectroscopy,and X-ray photoemission spectroscopy.The mechanical properties and wettability of N-DLC were analyzed by an ultra-micro hardness tester and JC2000DM system.The results show that the content ratio of N^(+)and N_(2)^(+)is positively correlated with the mechanical properties and wettability of N-DLC films.The enhancement hardness and elastic modulus of N-DLC are attributed to the increase in sp3 carbon–nitrogen bond content in the film,reaching 26.5 GPa and 160 GPa respectively.Water contact measurement shows that the increase in the nitrogen-bond structure in N-DLC gives the film excellent hydrophobic properties,and the optimal water contact angle reaches 111.2°.It is shown that HWP technology has unique advantages in the modulation of functional nanomaterials.

The application of a helicon plasma source in reactive sputter deposition of tungsten nitride thin films

A reactive helicon wave plasma(HWP)sputtering method is used for the deposition of tungsten nitride(WNx)thin films.N_(2)is introduced downstream in the diffusion chamber.The impacts of N_(2)on the Ar-HWP parameters,such as ion energy distribution functions(IEDFs),electron energy probability functions(EEPFs),electron temperature(Te)and density(ne),are investigated.With the addition of N_(2),a decrease in electron density is observed due to the dissociative recombination of electrons with N_(2)^(+).The similar IEDF curves of Ar+and N_(2)^(+) indicate that the majority ofN_(2)^(+) stems from the charge transfer in the collision between Ar+and N_(2).Moreover,due to the collisions between electrons and N_(2)ions,EEPFs show a relatively lower Tewith a depletion in the high-energy tail.With increasing negative bias from 50 to 200 V,a phase transition from hexagonal WN to fcc-WN0.5is observed,together with an increase in the deposition rate and roughness.

Enhanced antibacterial activity of cotton via silver nanocapsules deposited by atmospheric pressure plasma jet

In this work,the antibacterial activity of cotton containing silver nanocapsules prepared by atmospheric pressure plasma(APP)deposition is investigated.The nanocapsules consist of a shell and a silver nanoparticle(Ag NP)core,where the core is used to bring antibacterial activity,and the shell is utilized to suppress the potential toxicity of Ag NPs.The surface morphology and the elements of the samples are analyzed by scanning electron microscopy(SEM),energy dispersive x-ray and x-ray photoelectron spectroscopy(XPS).The SEM results show that the skin of the cotton fibers will fall off gradually after APP treatment over 3 min,and the XPS results show that the Ag content will rise to 1.6%after APP deposition for 10 min.Furthermore,the antimicrobial activity tests show that the reduction rates of Escherichia coli and Staphylococcus aureus can achieve 100%when the sample is treated for 10 min,which exhibits excellent antibacterial activity.In addition,the UV absorption properties of the cotton will also be correspondingly improved,which brings a broader application prospect for antibacterial cotton.

Synthesis of Ag-decorated vertical graphene nanosheets and their electrocatalytic efficiencies

Herein we report the successful preparation of silver(Ag)-decorated vertically oriented graphene sheets(Ag/VGs)via helicon wave plasma chemical vapor deposition(HWP-CVD)and radiofrequency plasma magnetron sputtering(RF-PMS).VGs were synthesized in a mixture of argon and methane(Ar/CH_(4))by HWP-CVD and then the Ag nanoparticles on the prepared VGs were modified using the RF-PMS system for different sputtering times and RF power levels.The morphology and structure of the Ag nanoparticles were characterized by scanning electron microscopy and the results revealed that Ag nanoparticles were evenly dispersed on the mesoporous wall of the VGs.X-ray diffraction results showed that the diameter of the Ag particles increased with the increase in Ag loading,and the average size was between 10.49 nm and 25.9 nm,consistent with the transmission electron microscopy results.Ag/VGs were investigated as effective electrocatalysts for use in an alkaline aqueous system.Due to the uniquely ordered and interconnected wall structure of VGs,the area of active sites increased with the Ag loading,giving the Ag/VGs a good performance in the oxygen evolution reaction.The double-layer capacitance(C_(dl))of the Ag/VGs under different Ag loadings were studied,and the results showed that the highest Ag content gave the best C_(dl)(1.04 mF cm^(-2)).Our results show that Ag/VGs are likely to be credible electrocatalytic materials.

Exploring negative ion behaviors and their influence on properties of DC magnetron sputtered ITO films under varied power and pressure conditions

We deposited indium-tin-oxide(ITO)films on silicon and quartz substrates by magnetron sputtering technology in pure argon.Using electrostatic quadrupole plasma diagnostic technology,we investigate the effects of discharge power and discharge pressure on the ion flux and energy distribution function of incidence on the substrate surface,with special attention to the production of high-energy negative oxygen ions,and elucidate the mechanism behind its production.At the same time,the structure and properties of ITO films are systematically characterized to understand the potential effects of high energy oxygen ions on the growth of ITO films.Combining with the kinetic property analysis of sputtering damage mechanism of transparent conductive oxide(TCO)thin films,this study provides valuable physical understanding of optimization of TCO thin film deposition process.