Benzoylfonnamide（BFA） derivatives are proposed as new photocagcd bases with good solubility in epoxy resin.Initially their structures were confirmed by ~1H NMR,^（13）C NMR,and elemental analysis.Next,we detail thei...Benzoylfonnamide（BFA） derivatives are proposed as new photocagcd bases with good solubility in epoxy resin.Initially their structures were confirmed by ~1H NMR,^（13）C NMR,and elemental analysis.Next,we detail their thermal stability,solubility behavior,and photolysis products.Furthermore,the model photo-latent anion polymerization（AP） of epoxide system in the presence of BFA-dBA（N,N-dibenzyl-2-oxo-2-phenylacetamide） as a photocaged base has been investigated,and excellent photopolymerization profile is obtained.展开更多
基金financially supported by National Natural Science Foundation of China(No.21374135)China Postdoctoral Science Foundation(Nos.2013M542178 and 2014M562183)+1 种基金the Open Foundation of the State Key Laboratory of Pulp and Paper Engineering in South China University of Technology(No.C713043z)the Fundamental Research Funds for the Central Universities (No.2013ZB0025)
文摘Benzoylfonnamide（BFA） derivatives are proposed as new photocagcd bases with good solubility in epoxy resin.Initially their structures were confirmed by ~1H NMR,^（13）C NMR,and elemental analysis.Next,we detail their thermal stability,solubility behavior,and photolysis products.Furthermore,the model photo-latent anion polymerization（AP） of epoxide system in the presence of BFA-dBA（N,N-dibenzyl-2-oxo-2-phenylacetamide） as a photocaged base has been investigated,and excellent photopolymerization profile is obtained.
