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Multiple-patterning colloidal lithography-implemented scalable manufacturing of heat-tolerant titanium nitride broadband absorbers in the visible to near-infrared 被引量:5
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作者 Dasol Lee myeongcheol go +4 位作者 Minkyung Kim Junho Jang Chungryong Choi Jin Kon Kim Junsuk Rho 《Microsystems & Nanoengineering》 EI CSCD 2021年第2期51-58,共8页
Broadband perfect absorbers have been intensively researched for decades because of their near-perfect absorption optical property that can be applied to diverse applications. Unfortunately, achieving large-scale and ... Broadband perfect absorbers have been intensively researched for decades because of their near-perfect absorption optical property that can be applied to diverse applications. Unfortunately, achieving large-scale and heat-tolerant absorbers has been remained challenging work because of costly and time-consuming lithography methods and thermolability of materials, respectively. Here, we demonstrate a thermally robust titanium nitride broadband absorber with >95% absorption efficiency in the visible and near-infrared region (400–900 nm). A relatively large-scale (2.5 cm × 2.5 cm) absorber device is fabricated by using a fabrication technique of multiple-patterning colloidal lithography. The optical properties of the absorber are still maintained even after heating at the temperatures >600 ∘C. Such a large-scale, heat-tolerant, and broadband near-perfect absorber will provide further useful applications in solar thermophotovoltaics, stealth, and absorption controlling in high-temperature conditions. 展开更多
关键词 ABSORBER titanium absorption
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