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Microstructures of InN film on 4H-SiC(0001) substrate grown by RF-MBE 被引量:3
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作者 p.jantawongrit S.Sanorpim +2 位作者 H.Yaguchi M.Orihara P.Limsuwan 《Journal of Semiconductors》 EI CAS CSCD 2015年第8期37-41,共5页
InN film was grown on 4H-SiC (0001) substrate by RF plasma-assisted molecular beam epitaxy (RF- MBE). Prior to the growth of InN film, an InN buffer layer with a thickness of ~5.5 nm was grown on the substrate. S... InN film was grown on 4H-SiC (0001) substrate by RF plasma-assisted molecular beam epitaxy (RF- MBE). Prior to the growth of InN film, an InN buffer layer with a thickness of ~5.5 nm was grown on the substrate. Surface morphology, microstructure and structural quality of InN film were investigated. Micro-structural defects, such as stacking faults and anti-phase domain in InN film were carefully investigated using transmission electron microscopy (TEM). The results show that a high density of line contrasts, parallel to the growth direction (c-axis), was clearly observed in the grown InN film. Dark field TEM images recorded with diffraction vectors g = 1120 and g = 0002 revealed that such line contrasts evolved from a coalescence of the adjacent rnisoriented islands during the initial stage of the InN nucleation on the substrate surface. This InN nucleation also led to a generation of anti-phase domains. 展开更多
关键词 RF-MBE TEM INN threading dislocation anti-phase domain crystal polarity
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