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磷掺杂类金刚石薄膜的制备与性能研究 被引量:5
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作者 王进 Sunny C.H.Kwok +3 位作者 陈俊英 杨萍 黄楠 p.k.chu 《真空科学与技术学报》 EI CAS CSCD 北大核心 2005年第2期123-126,共4页
应用等离子体浸没离子注入与沉积方法合成了磷掺杂的类金刚石(P doped diamond like carbon,P-aopea DLC)薄膜。结构分析表明磷以微米级岛状结构分散于DLC薄膜表层,P的掺杂增加了DLC薄膜的无序性,俄歇能谱证明岛型区域是由P、C、O三种... 应用等离子体浸没离子注入与沉积方法合成了磷掺杂的类金刚石(P doped diamond like carbon,P-aopea DLC)薄膜。结构分析表明磷以微米级岛状结构分散于DLC薄膜表层,P的掺杂增加了DLC薄膜的无序性,俄歇能谱证明岛型区域是由P、C、O三种元素形成的化合物,衰减全反射傅里叶红外光谱(ATR-FTIR)的分析结果显示存在P-O-P和P-P-C的非对称伸缩振动。掺杂表面表现出强烈的亲水性(水接触角为16.9°),体外血小板粘附实验结果显示,P掺杂DLC薄膜表面粘附的血小板少且变形小,表现出的血液相容性优于热解碳和未改性DLCo。P-doped DLC薄膜与水的界面张力为2.7 nJ/cm2,具有较理想的接近于血细胞的界面张力,因此与血液保持了较高的相容性。 展开更多
关键词 类金刚石薄膜 磷掺杂 性能研究 等离子体浸没离子注入 DLC薄膜 diamond 制备 carbon 界面张力 衰减全反射 血小板粘附 血液相容性 沉积方法 like 俄歇能谱 元素形成 伸缩振动 分析结果 红外光谱 水接触角 薄膜表面 微米级
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In situ synthesis of nanostructured titania film on NiTi shape memory alloy by Fenton’s oxidation method 被引量:3
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作者 储成林 胡涛 +5 位作者 S.L.Wu 王如萌 董寅生 林萍华 C.Y.Chung p.k.chu 《中国有色金属学会会刊:英文版》 EI CSCD 2007年第5期902-906,共5页
Fenton’s oxidation method was successfully used to synthesize an ideal titania film in situ on NiTi shape memory alloy(SMA) for medical applications. Characterized with scanning electron microscopy, X-ray photoelectr... Fenton’s oxidation method was successfully used to synthesize an ideal titania film in situ on NiTi shape memory alloy(SMA) for medical applications. Characterized with scanning electron microscopy, X-ray photoelectron spectroscopy, X-ray diffractometry, inductively coupled plasma mass spectrometry and electrochemical tests, it is found that the titania film produced by Fenton’s oxidation method on NiTi SMA is nanostructured and has a Ni-free zone near its top surface, which results in a notable improvement in corrosion resistance and a remarkable decrease in leaching of harmful Ni ions from NiTi SMA in simulated body fluids. The improvement of effectiveness to corrosion resistance and the reduction in Ni release of NiTi SMA by Fenton’s oxidation method are comparable to those by oxygen plasma immersion ion implantation reported earlier. 展开更多
关键词 NITI记忆合金 氧化反应 薄膜 腐蚀
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Uniformity of TiN Films Fabricated by Hollow Cathode Discharge 被引量:2
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作者 姜海富 巩春志 +3 位作者 田修波 杨士勤 R.K.Y.FU p.k.chu 《Plasma Science and Technology》 SCIE EI CAS CSCD 2010年第2期212-217,共6页
Titanium nitride (TIN) films were deposited on AISI 304 stainless steel substrates using hollow cathode plasma physical vapor deposition (HC-PVD). Titanium was introduced by eroding the Ti cathode nozzle and TiN w... Titanium nitride (TIN) films were deposited on AISI 304 stainless steel substrates using hollow cathode plasma physical vapor deposition (HC-PVD). Titanium was introduced by eroding the Ti cathode nozzle and TiN was formed in the presence of a nitrogen plasma excited by radio frequency (RF). The substrate bias voltage was varied from 0 to -300 V and the uniformity in film thickness, surface roughness, crystal size, microhardness and wear resistance for the film with a diameter of 20 mm was evaluated. Although the central zone of the plasma had the highest ion density, the film thickness did not vary appreciably across the sample. The results from atomic force microscopy (AFM) revealed a low surface roughness dominated by an island-like morphology with a similar crystal size on the entire surface. Higher microhardness was measured at the central zone of the sample. The sample treated at -200 V had excellent tribological properties and uniformity. 展开更多
关键词 hollow cathode TiN film UNIFORMITY
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Bioactivity of Ceramic Coating on Ti6Al4V Fabricated By Microarc Plasma Oxidation
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作者 SHENLiru LIUChenling +1 位作者 LIJiong p.k.chu 《Southwestern Institute of Physics Annual Report》 2003年第1期138-140,共3页
Ti6Al4V is a widely applied in medical implants such as bone, joint, and teeth due to its excellent mechanical properties, corrosion resistance, plasticity and the biocompatibility of the surface oxide. However, the n... Ti6Al4V is a widely applied in medical implants such as bone, joint, and teeth due to its excellent mechanical properties, corrosion resistance, plasticity and the biocompatibility of the surface oxide. However, the native surface oxide film is quite thin (about 5 nm)and techniques such as microarc oxidation,plasma sprayed hydroxyapatitae and plasma immersion ion implantation are used to synthesize thicker surface titanium oxide. 展开更多
关键词 微弧氧化 生物活性 TI6A14V 氧化钛保护膜 金属材料
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Capacitance of High-Voltage Coaxial Cable in Plasma Immersion Ion Implantation
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作者 X.B.Tian L.P.Wang +2 位作者 D.T.K.Kwok B.Y Tang p.k.chu 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2001年第1期41-42,共2页
Plasma immersion ion implantation (PIII) is an excellent technique for the surf see modification of complex-shaped components. Owing to pulsed operation mode of the high voltage and large slew rate, the capacitance on... Plasma immersion ion implantation (PIII) is an excellent technique for the surf see modification of complex-shaped components. Owing to pulsed operation mode of the high voltage and large slew rate, the capacitance on the high-voltage coaxial cable can be detrimental to the process and cannot be ignored. In fact, a significant portion of the rise-time/fall-time of the implantation voltage pulse and big initial current can be attributed to the coaxial cable. 展开更多
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