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Theoretical calculations on the atomic and electronic structure of β-SiC(110) surface 被引量:1
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作者 Changkun Xie pengshou xu +1 位作者 Faqiang xu Haibin Pan 《Chinese Science Bulletin》 SCIE EI CAS 2002年第10期804-809,共6页
We present a theoretical calculation of the atomic and electronic structure of β-SiC and its non-polar (110) surface using the full potential linear augmented plane wave (FPLAPW) approach. The calculated lattice cons... We present a theoretical calculation of the atomic and electronic structure of β-SiC and its non-polar (110) surface using the full potential linear augmented plane wave (FPLAPW) approach. The calculated lattice constant and bulk modulus of p-SiC crystal are in excellent agreement with experimental data. The atomic and electronic structure of β-SiC(110) surface has been calculated by employing the slab and supercell model. It is found that the surface is characterized by a top-layer bond-length-contracting rotation relaxation in which the Si-surface atom moves closer towards the substrate while the C-surface atom moves outward. This relaxation is analogous to that of Ⅲ-Ⅴ semiconductor surface. The driving mechanism for this atomic rearrangement is that the Si atom tends to a planar sp2-like bonding situation with its three N neighbors and the N atom tends to a p3-like bonding with its three Si neighbors. Furthermore, surface relaxation induces the change from metallic to semiconducting 展开更多
关键词 SiC FPLAPW method SURFACE ATOMIC STRUCTURE SURFACE electronic structure.
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Synchrotron radiation photoemission study on growth of gadolinium film over Ni(110)surface 被引量:1
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作者 Faqiang xu Junfa Zhu +5 位作者 Yuming Sun Xianfeng Wang Erdong Lu pengshou xu Xinyi Zhang Shuxian Zhuang 《Chinese Science Bulletin》 SCIE EI CAS 1999年第4期328-331,共4页
The growth of Gd film on Ni(110) surfaco was studied by synchrotron radiation photoemission spectroscopy and XPS techniques. It is revealed that in the coverage range of 0—0.22 nm Gd4f core level showed a single-peak... The growth of Gd film on Ni(110) surfaco was studied by synchrotron radiation photoemission spectroscopy and XPS techniques. It is revealed that in the coverage range of 0—0.22 nm Gd4f core level showed a single-peak structure, therefore Gd film grows over Ni(110) in the layer-by-layer mode. However, when Gd coverage was larger than 0.22, nm the Gd4f peak turned gradually into double-peak and a double-peak structure with 2.3 eV separation was formed at 1.51 nm, meanwhile similar phenomenon was observed in the Gd4d XPS spectra. It is suggested that the double-peak structure of Gd4f was derived from the growth of Gd film in cluster mode and the Gd atomic clusters may exhibit different electronic states from Gd metal owing to their special structures. The Gd4f double-peak evolved into a single-peak on annealing at 600 K, implying that Gd clusters are thermodynamically unstable. 展开更多
关键词 Gd FILM SYNCHROTRON radiation Ni(110) surface.
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