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Crystallization of NiTi shape memory alloy sputtering-deposition film
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作者 qiu ping shan(邱平) SONG Run bin(宋润滨) +3 位作者 HUANG Wei xin(黄渭馨) LI Yun xi(李运稀) WANG Gui song(王桂松) YU Wei dong(于伟东) 《中国有色金属学会会刊:英文版》 CSCD 2000年第3期320-323,共4页
The crystallization of NiTi shape memory alloy sputter deposition film in the course of sputtering deposition and that after heat treated were studied. The relationship between the process factors, such as substrate t... The crystallization of NiTi shape memory alloy sputter deposition film in the course of sputtering deposition and that after heat treated were studied. The relationship between the process factors, such as substrate type, temperature, as well as the crystallization when heat treated after plating was investigated. The results show that a new phase precipitates during heat treatment after sputtering deposition and the degree of crystallization among different layers and the stress in grains are obviously different. 展开更多
关键词 SPUTTERING DEPOSITION films CRYSTALLIZATION SHAPE MEMORY ALLOYS
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