Design of high efficiency achromatic metalens with large operation bandwidth using bilayer architecture

Achromatic metalens composed of arrays of subwavelength nanostructures with spatially varying geometries is attractivefor a number of optical applications. However, the limited degree of freedom in the single layer achromatic metasurfacedesign makes it difficult to simultaneously guarantee the sufficient phase dispersion and high diffraction efficiency,which restricts the achromatic bandwidth and efficiency of metalens. Here we propose and demonstrate a high efficiencyachromatic metalens with diffraction-limited focusing capability at the wavelength ranging from 1000 nm to 1700 nm. Themetalens comprises two stacked nanopillar metasurfaces, by which the required focusing phase and dispersion compensationcan be controlled independently. As a result, in addition to the large achromatic bandwidth, the averaged focusingefficiency of the bilayer metalens is higher than 64% at the near-infrared region. Our design opens up the possibilityto obtain the required phase dispersion and efficiency simultaneously, which is of great significance to design broadbandmetasurface-based optical devices.

All-dielectric metasurface beam deflector at the visible frequencies

Beam deflectors are important optical elements which can control the propagation direction of the beam in free space.However,with the development of miniaturization of the optical systems,conventional reflector-based mechanical beam deflectors confront a huge challenge due to their large sizes and incompatibility to the device integration.Here we propose an all-dielectric flat metasurface beam deflector which is composed of a single layer array of TiO_2 nanoantennas resting on a fused-silica substrate.Numerical simulations are performed to demonstrate that the proposed deflectors are able to efficiently deflect the incident beam for different angles with transmission efficiency higher than 80%at visible frequencies.This ultrathin all-dielectric metasurface deflector may have great potential applications in integrated optics.

Metasurface-based computational imaging:a review

Metasurface-based imaging has attracted considerable attention owing to its compactness,multifunctionality,and subwavelength coding capability.With the integration of computational imaging techniques,researchers have actively explored the extended capabilities of metasurfaces,enabling a wide range of imaging methods.We present an overview of the recent progress in metasurface-based imaging techniques,focusing on the perspective of computational imaging.Specifically,we categorize and review existing metasurface-based imaging into three main groups,including(i)conventional metasurface design employing canonical methods,(ii)computation introduced independently in either the imaging process or postprocessing,and(iii)an end-to-end computation-optimized imaging system based upon metasurfaces.We highlight the advantages and challenges associated with each computational metasurface-based imaging technique and discuss the potential and future prospects of the computational boosted metaimager.

Low-loss metasurface optics down to the deep ultraviolet region

Shrinking conventional optical systems to chip-scale dimensions will benefit custom applications in imaging,displaying,sensing,spectroscopy,and metrology.Towards this goal,metasurfaces-planar arrays of subwavelength electromagnetic structures that collectively mimic the functionality of thicker conventional optical elements-have been exploited at frequencies ranging from the microwave range up to the visible range.Here,we demonstrate highperformance metasurface optical components that operate at ultraviolet wavelengths,including wavelengths down to the record-short deep ultraviolet range,and perform representative wavefront shaping functions,namely,highnumerical-aperture lensing,accelerating beam generation,and hologram projection.The constituent nanostructured elements of the metasurfaces are formed of hafnium oxide-a loss-less,high-refractive-index dielectric material deposited using low-temperature atomic layer deposition and patterned using high-aspect-ratio Damascene lithography.This study opens the way towards low-form factor,multifunctional ultraviolet nanophotonic platforms based on flat optical components,enabling diverse applications including lithography,imaging,spectroscopy,and quantum information processing.