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Observation of the failure mechanism in Ag_(10)Ge_(15)Te_(75)-based memristor induced by ion transport
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作者 Yuwei Xiong Kuibo Yin +7 位作者 Weiwei Sun Jingcang Li Shangyang Shang Lei Xin qiyun wu Xiaoran Gong Yidong Xia Litao Sun 《Nano Research》 SCIE EI CSCD 2024年第9期8431-8437,共7页
The solid-electrolyte-based memristors have attracted tremendous attention for the next-generation nonvolatile memory for both logic and neuromorphic applications.However,they encounter variability performance challen... The solid-electrolyte-based memristors have attracted tremendous attention for the next-generation nonvolatile memory for both logic and neuromorphic applications.However,they encounter variability performance challenges which originated from the random ionic transport and conductive filaments formation.Evidently,the electrochemical metallized mechanism associated with ion transport has been elucidated.Nonetheless,the failure mechanism caused by ion transport during cycles is rarely reported.Hereafter,the five stages of failure in the Ag/Ag_(10)Ge_(15)Te_(75)/W memristor are elucidated through ex-situ current-voltage measurements combined with in-situ transmission electron microscopy characteristics.Our investigation reveals that the migration and enrichment of Ag ions result in the precipitation of Ag_(2)Te.The formation of Ag_(2)Te hinders the device's ability to maintain its bipolar characteristics and also decreases the resistance value of the high resistance state,thereby reducing the device's switching ratio.The promising results provide important guidance for the future design of structures and the manipulation of ion transport for high-performance memristors. 展开更多
关键词 Ag10Ge15Te75 in-situ transmission electron microscopy(TEM) failure mechanism
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