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Off-stoichiometry indexation of BiFeO_3 thin film on silicon by Rutherford backscattering spectrometry
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作者 Ze-Song Wang ren-zheng xiao +6 位作者 Chang-Wei Zou Wei Xie Can-Xin Tian Shu-Wen Xue Gui-Ang Liu Neena Devi De-Jun Fu 《Chinese Physics B》 SCIE EI CAS CSCD 2018年第4期503-508,共6页
BiFeO3 is a multiferroic material with physical properties very sensitive to its stoichiometry.BiFeO3 thin films on silicon substrate are prepared by the sol–gel method combined with layer-by-layer annealing and fina... BiFeO3 is a multiferroic material with physical properties very sensitive to its stoichiometry.BiFeO3 thin films on silicon substrate are prepared by the sol–gel method combined with layer-by-layer annealing and final annealing schemes.X-ray diffraction and scanning electron microscopy are employed to probe the phase structures and surface morphologies.Using Rutherford backscattering spectrometry to quantify the nonstoichiometries of BiFeO3 thin films annealed at 100?C–650?C.The results indicate that Bi and Fe cations are close to the stoichiometry of BiFeO3,whereas the deficiency of O anions possibly plays a key role in contributing to the leakage current of 10^-5 A/cm^2 in a wide range of applied voltage rather than the ferroelectric polarizations of BiFeO3 thin films annealed at high temperature. 展开更多
关键词 BiFeO3 thin films off-stoichiometry high temperature annealing backscattering spectrometry
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