Photonic devices increasingly require three-dimensional control of refractive index,but existing fabrication methods such as femtosecond micromachining,multilayer lithography and bulk diffusion can only address a sele...Photonic devices increasingly require three-dimensional control of refractive index,but existing fabrication methods such as femtosecond micromachining,multilayer lithography and bulk diffusion can only address a select scale range,are often limited in complexity or thickness and have low throughput.We introduce a new fabrication method and polymeric material that can efficiently create mm^(3) optical devices with programmable,gradient index of refraction with arbitrary feature size.Index contrast of 0.1 is demonstrated,which is 100 times larger than femtosecond micromachining,and 20 times larger than commercial holographic photopolymers.This is achieved by repetitive microfluidic layering of a self-developing photopolymer structured by projection lithography.The process has the unusual property that total fabrication time for a fixed thickness decreases with the number of layers,enabling fabrication 10^(5) faster than femtosecond micromachining.We demonstrate the process by sequentially writing 100 layers to fabricate a mm thick waveguide array.展开更多
基金We gratefully acknowledge the support of an NSF STTR(grant no.IIP-0822695)an AF MURI(grant no.FA9550-09-1-0677)+3 种基金an NSF IGERTCOSI Fellowship for this pWe gratefully acknowledge the support of an NSF STTR(grant no.IIP-0822695)an AF MURI(grant no.FA9550-09-1-0677)an NSF IGERTCOSI Fellowship for this projectThis research was supported in part by the NNIN at the Colorado Nanofabrication Laboratory and the National Science Foundation under grant no.ECS-0335765.roject.This research was supported in part by the NNIN at the Colorado Nanofabrication Laboratory and the National Science Foundation under grant no.ECS-0335765.We thank Dr Carol Cogswell for the use of her DIC microscope.We would also like to thank Dr Christopher Bowman for his technical contributions.
文摘Photonic devices increasingly require three-dimensional control of refractive index,but existing fabrication methods such as femtosecond micromachining,multilayer lithography and bulk diffusion can only address a select scale range,are often limited in complexity or thickness and have low throughput.We introduce a new fabrication method and polymeric material that can efficiently create mm^(3) optical devices with programmable,gradient index of refraction with arbitrary feature size.Index contrast of 0.1 is demonstrated,which is 100 times larger than femtosecond micromachining,and 20 times larger than commercial holographic photopolymers.This is achieved by repetitive microfluidic layering of a self-developing photopolymer structured by projection lithography.The process has the unusual property that total fabrication time for a fixed thickness decreases with the number of layers,enabling fabrication 10^(5) faster than femtosecond micromachining.We demonstrate the process by sequentially writing 100 layers to fabricate a mm thick waveguide array.
