In this work, was obtained metallic decorated, single wall Carbon Nanotubes (SWCNTs) using High Density Chemical Vapor Deposition (HDPCVD) system on chromium thin films on a silicon wafers substrate. The characteristi...In this work, was obtained metallic decorated, single wall Carbon Nanotubes (SWCNTs) using High Density Chemical Vapor Deposition (HDPCVD) system on chromium thin films on a silicon wafers substrate. The characteristics of this deposition method are capacity of the segregation of metallic nanoparticlesas seed for the SWCNT growing. Use of magnetic particle decorated carbon nanotubes increases the applications in magnetic devices, magnetic memory, and magnetic oriented drug delivery. The CNTs’ spectra show a unique emission band, but due to the presence of the chromium, the spectra obtained in this work showed many bands that are related to the CNTs with different diameters. The CNTs obtained by the HDPCVD system are highly aligned and showed metallic features. Results of this work proved the possibility of obtaining the controlled deposition of aligned single-walled CNTs forest films decorated with chromium and suggested future studies in magnetic devices applications.展开更多
In this work, we studied the electro-optical properties of high-aligned carbon nanotubes deposited at room temperature. For this, we used the High Density Plasma Chemical Vapor Deposition system. This system uses a ne...In this work, we studied the electro-optical properties of high-aligned carbon nanotubes deposited at room temperature. For this, we used the High Density Plasma Chemical Vapor Deposition system. This system uses a new concept of plasma generation: a planar coil is coupled to an RF system for plasma generation. This was used together with an electrostatic shield, for plasma densification, thereby obtaining high-density plasmas. The carbon nanotubes were deposited using pure methane plasmas. Three methods were used for the surface modification of the sample: reference substrate (silicon wafer only submitted to a chemical cleaning), silicon wafer with surface roughness generated by plasma etching, silicon wafer with a thin iron film and silicon wafer with diamond nano powder used as precursor materials. For each kind of silicon wafer surface, the carbon nanotubes were deposited with two different deposition times (two and three hours). The carbon nanotubes structural characteristics were analyzed by Atomic Force Microscope and Scanning Electronic Microscope. The carbon nanotubes electrical characteristics were observed by Raman Spectroscopy and the carbon nanotubes electro-optical properties were analyzed by current vs voltage electrical measurements and photo-luminescence spectroscopy measurements. The photoelectric effect in the carbon nanotubes were determined by photo-induced current measurements. In this work, we obtained carbon nanotubes with semiconductor properties and carbon nanotubes with metallic properties. The electro-optical effects depend strongly on the substrate preparation and the deposition parameters of the carbon nanotubes. The carbon nanotubes are high aligned and show singular properties that can be used for many applications.展开更多
文摘In this work, was obtained metallic decorated, single wall Carbon Nanotubes (SWCNTs) using High Density Chemical Vapor Deposition (HDPCVD) system on chromium thin films on a silicon wafers substrate. The characteristics of this deposition method are capacity of the segregation of metallic nanoparticlesas seed for the SWCNT growing. Use of magnetic particle decorated carbon nanotubes increases the applications in magnetic devices, magnetic memory, and magnetic oriented drug delivery. The CNTs’ spectra show a unique emission band, but due to the presence of the chromium, the spectra obtained in this work showed many bands that are related to the CNTs with different diameters. The CNTs obtained by the HDPCVD system are highly aligned and showed metallic features. Results of this work proved the possibility of obtaining the controlled deposition of aligned single-walled CNTs forest films decorated with chromium and suggested future studies in magnetic devices applications.
文摘In this work, we studied the electro-optical properties of high-aligned carbon nanotubes deposited at room temperature. For this, we used the High Density Plasma Chemical Vapor Deposition system. This system uses a new concept of plasma generation: a planar coil is coupled to an RF system for plasma generation. This was used together with an electrostatic shield, for plasma densification, thereby obtaining high-density plasmas. The carbon nanotubes were deposited using pure methane plasmas. Three methods were used for the surface modification of the sample: reference substrate (silicon wafer only submitted to a chemical cleaning), silicon wafer with surface roughness generated by plasma etching, silicon wafer with a thin iron film and silicon wafer with diamond nano powder used as precursor materials. For each kind of silicon wafer surface, the carbon nanotubes were deposited with two different deposition times (two and three hours). The carbon nanotubes structural characteristics were analyzed by Atomic Force Microscope and Scanning Electronic Microscope. The carbon nanotubes electrical characteristics were observed by Raman Spectroscopy and the carbon nanotubes electro-optical properties were analyzed by current vs voltage electrical measurements and photo-luminescence spectroscopy measurements. The photoelectric effect in the carbon nanotubes were determined by photo-induced current measurements. In this work, we obtained carbon nanotubes with semiconductor properties and carbon nanotubes with metallic properties. The electro-optical effects depend strongly on the substrate preparation and the deposition parameters of the carbon nanotubes. The carbon nanotubes are high aligned and show singular properties that can be used for many applications.
