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Design and simulation of a novel E-mode GaN MIS-HEMT based on a cascode connection for suppression of electric field under gate and improvement of reliability
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作者 Weiyi Li Zhili Zhang +8 位作者 Kai Fu Guohao Yu Xiaodong Zhang Shichuang Sun Liang Song ronghui hao Yaming Fan Yong Cai Baoshun Zhang 《Journal of Semiconductors》 EI CAS CSCD 2017年第7期49-55,共7页
We proposed a novel Al Ga N/Ga N enhancement-mode(E-mode) high electron mobility transistor(HEMT) with a dual-gate structure and carried out the detailed numerical simulation of device operation using Silvaco Atla... We proposed a novel Al Ga N/Ga N enhancement-mode(E-mode) high electron mobility transistor(HEMT) with a dual-gate structure and carried out the detailed numerical simulation of device operation using Silvaco Atlas. The dual-gate device is based on a cascode connection of an E-mode and a D-mode gate. The simulation results show that electric field under the gate is decreased by more than 70% compared to that of the conventional E-mode MIS-HEMTs(from 2.83 MV/cm decreased to 0.83 MV/cm). Thus, with the discussion of ionized trap density, the proposed dual-gate structure can highly improve electric field-related reliability, such as, threshold voltage stability. In addition, compared with HEMT with field plate structure, the proposed structure exhibits a simplified fabrication process and a more effective suppression of high electric field. 展开更多
关键词 GaN HEMT enhancement-mode electric field distribution V_(th) instability
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