Using PTFE as a chemical modifier, a method for the determination of trace impurities in high purity Nd_2O_3 by in-situ separation and electrothermal vaporization-inductively coupled plasma-atomic emission spectrometr...Using PTFE as a chemical modifier, a method for the determination of trace impurities in high purity Nd_2O_3 by in-situ separation and electrothermal vaporization-inductively coupled plasma-atomic emission spectrometry (ETV-ICP-AES) was developed. The analyte-matrix separation and the temperature program of graphite furnace were investigated and optimized. The solid samples were directly introduced into graphite furnace in the form of slurry, where selective volatilization between the matrix and the analytes took place. The Nd matrix was retained in the graphite furnace during the evaporation step, while the trace analyte impurities were vaporized and removed. As a result, the matrix interference that is serious without the modifier is suppressed effectively. The achievable detection limits are (μg·g^(-1)): Ti 0.15, Mn 0.15, Ni 0.20, Co 0.54, respectively. The proposed method was applied to direct determination of trace impurities in high purity Nd_2O_3 with satisfactory results.展开更多
文摘Using PTFE as a chemical modifier, a method for the determination of trace impurities in high purity Nd_2O_3 by in-situ separation and electrothermal vaporization-inductively coupled plasma-atomic emission spectrometry (ETV-ICP-AES) was developed. The analyte-matrix separation and the temperature program of graphite furnace were investigated and optimized. The solid samples were directly introduced into graphite furnace in the form of slurry, where selective volatilization between the matrix and the analytes took place. The Nd matrix was retained in the graphite furnace during the evaporation step, while the trace analyte impurities were vaporized and removed. As a result, the matrix interference that is serious without the modifier is suppressed effectively. The achievable detection limits are (μg·g^(-1)): Ti 0.15, Mn 0.15, Ni 0.20, Co 0.54, respectively. The proposed method was applied to direct determination of trace impurities in high purity Nd_2O_3 with satisfactory results.
