In this study,plasma density measurements were performed near the plume region of the remote plasma source (RPS) in Ar/NF3 gas mixtures using a microwave cutoff probe.The measured plasma density is in the range of 101...In this study,plasma density measurements were performed near the plume region of the remote plasma source (RPS) in Ar/NF3 gas mixtures using a microwave cutoff probe.The measured plasma density is in the range of 1010-1011 cm-3 in the discharge conditions with RPS powers of 2-4 kW and gas pressures of 0.87-4 Torr.The plasma density decreased with increasing gas pressures and RPS powers under various Ar/NF3 mixing ratios.This decrease in the plasma density measured at the fixed measurement position (plume region) can be understood by the reduction of the electron energy relaxation length with increases in the gas pressures and mixing ratio of NF3/(Ar/NF3).We also performed downstream etching of silicon and silicon oxide films in this system.The etch rate of the silicon films significantly increases while the silicon oxide is slightly etched with the gas pressures and powers.It was also found that the etch rate strongly depends on the wafer position on the processing chamber electrode,and that the etch selectivity reached 96-131 in the discharge conditions of RF powers (3730-4180 W) and gas pressures (3.6-4 Torr).展开更多
Despite the fact that a radio frequency (RF) shielding box affects a coil inductance used in matching network,RF engineers have used a coil inductance measured in open space on designing matching networks since it is ...Despite the fact that a radio frequency (RF) shielding box affects a coil inductance used in matching network,RF engineers have used a coil inductance measured in open space on designing matching networks since it is difficult to precisely measure the coil inductance within the RF shielding box.In this work,we investigate the influences of the RF shielding box on the coil inductance via a 3D full electromagnetic wave simulation.Simulation results shows that the coil inductance decreases from-6.0% to-11.9% compared with its ideal inductance depending on coil positions within the RF shielding box.Both inductive and capacitive coupling between the coil and surfaces of the RF shielding box contribute to the reduction of the coil inductance.We expect that these results would be useful for those who design RF matching networks.展开更多
文摘In this study,plasma density measurements were performed near the plume region of the remote plasma source (RPS) in Ar/NF3 gas mixtures using a microwave cutoff probe.The measured plasma density is in the range of 1010-1011 cm-3 in the discharge conditions with RPS powers of 2-4 kW and gas pressures of 0.87-4 Torr.The plasma density decreased with increasing gas pressures and RPS powers under various Ar/NF3 mixing ratios.This decrease in the plasma density measured at the fixed measurement position (plume region) can be understood by the reduction of the electron energy relaxation length with increases in the gas pressures and mixing ratio of NF3/(Ar/NF3).We also performed downstream etching of silicon and silicon oxide films in this system.The etch rate of the silicon films significantly increases while the silicon oxide is slightly etched with the gas pressures and powers.It was also found that the etch rate strongly depends on the wafer position on the processing chamber electrode,and that the etch selectivity reached 96-131 in the discharge conditions of RF powers (3730-4180 W) and gas pressures (3.6-4 Torr).
文摘Despite the fact that a radio frequency (RF) shielding box affects a coil inductance used in matching network,RF engineers have used a coil inductance measured in open space on designing matching networks since it is difficult to precisely measure the coil inductance within the RF shielding box.In this work,we investigate the influences of the RF shielding box on the coil inductance via a 3D full electromagnetic wave simulation.Simulation results shows that the coil inductance decreases from-6.0% to-11.9% compared with its ideal inductance depending on coil positions within the RF shielding box.Both inductive and capacitive coupling between the coil and surfaces of the RF shielding box contribute to the reduction of the coil inductance.We expect that these results would be useful for those who design RF matching networks.
