Pyroelectric measurements are conducted during zero-field heating in [001],[110] and [111] poled 0.69Pb(Mg_(1/3)Nb_(2/3))O_(3)-0.31PbTiO_(3) single crystals.Compared to the room-temperature-poled samples,the crystals ...Pyroelectric measurements are conducted during zero-field heating in [001],[110] and [111] poled 0.69Pb(Mg_(1/3)Nb_(2/3))O_(3)-0.31PbTiO_(3) single crystals.Compared to the room-temperature-poled samples,the crystals poled by using the field cooling method show broad but well recognizable pyroelectric current peaks near 190℃,which is much higher than the Curie point (126℃) of the crystal.We propose that this peak of the crystals poled by field-cooling above the Curie point is ascribed to the order-disorder transition of the dipoles in polar nano-regions formed at the Burns temperature.展开更多
A fractal aggregation behavior in amorphous silicon nitride(Si_(x) N_(y))films deposited by microwave electron cyclotron resonance plasma chemical vapor deposition is reported.The fractal structure and dimension of 1....A fractal aggregation behavior in amorphous silicon nitride(Si_(x) N_(y))films deposited by microwave electron cyclotron resonance plasma chemical vapor deposition is reported.The fractal structure and dimension of 1.45 obtained by experiment and computer simulation are all in excellent agreement with the result predicted by the cluster-cluster-aggregation model.The forming of fractal structure is related to the change of discharge mode between ring plasma and bulk plasma.展开更多
文摘Pyroelectric measurements are conducted during zero-field heating in [001],[110] and [111] poled 0.69Pb(Mg_(1/3)Nb_(2/3))O_(3)-0.31PbTiO_(3) single crystals.Compared to the room-temperature-poled samples,the crystals poled by using the field cooling method show broad but well recognizable pyroelectric current peaks near 190℃,which is much higher than the Curie point (126℃) of the crystal.We propose that this peak of the crystals poled by field-cooling above the Curie point is ascribed to the order-disorder transition of the dipoles in polar nano-regions formed at the Burns temperature.
文摘A fractal aggregation behavior in amorphous silicon nitride(Si_(x) N_(y))films deposited by microwave electron cyclotron resonance plasma chemical vapor deposition is reported.The fractal structure and dimension of 1.45 obtained by experiment and computer simulation are all in excellent agreement with the result predicted by the cluster-cluster-aggregation model.The forming of fractal structure is related to the change of discharge mode between ring plasma and bulk plasma.
