不同浓度利多卡因湿敷对保守性锐器清创镇痛效果分析

目的观察不同浓度利多卡因对慢性伤口患者保守性锐器清创疼痛的效果。方法将90例慢性伤口患者采用随机数字表法分为3组,采用三阶段交叉设计的方案分别按照ABC、BCA、CAB的顺序进行试验。A、B、C分别代表生理盐水、1%利多卡因、2%利多卡因3种处理。观察患者在不同处理下保守性锐器清创的疼痛评分和患者因疼痛导致保守性锐器清创被迫暂停次数。结果疼痛评分和暂停次数显示A处理(生理盐水)较B、C处理(1%利多卡因、2%利多卡因)相比,差异有统计学意义(P<0.05);B、C(1%利多卡因、2%利多卡因)2种处理相比,当伤口深度<1 cm或伤口面积<9 cm2时差异无统计学意义(P>0.05);当伤口深度≥1 cm或伤口面积≥9 cm2时,差异有统计学意义(P<0.05)。结论 1%利多卡因对小面积或浅度伤口可以产生良好的止痛效果,当伤口变大或变深时,2%利多卡因的止痛效果更好。

First-Principles Study of Hydrogen Impact on the Formation and Migration of Helium Interstitial Defects in hcp Titanium

We present a first-principles study of the effects of hydrogen on helium behavior in hcp titanium.The calculation indicates that the dissolved H atoms in hcp Ti change the formation energy of the interstitial He atom,but they do not change the energetically favorable occupying site of the He atom,i.e.,the tetrahedral site is more favorable than the octahedral site.The impacts of H on the formation of interstitial He defects are directly related to the atomic environment around H atoms and their positions relative to interstitial He atoms as well.For He diffusion,a tetrahedral interstitial He atom can more easily migrate along the indirect tetrahedron-octahedron-tetrahedron path than the direct path of tetrahedron-tetrahedron.When a H atom exists in the first neighbor octahedral site from the He,the activation energy for He atom diffusion is 0.46eV,which is higher than that of the He atom diffusion in perfect crystal,0.41 eV.Increasing the number of H atoms to two,He diffusion needs much higher activation energy.This suggests that the H atoms around interstitial He may impede the migration of interstitial He atom in hcp Ti.

P-type ZnO:N Films Prepared by Thermal Oxidation of Zn_(3)N_(2)

We prepare p-type ZnO:N films by annealing Zn_(3)N_(2) films in oxygen over a range of temperatures.The prepared films are characterized by various techniques,such as Rutherford backscattering spectroscopy,x-ray diffraction,x-ray photoemission spectroscopy,the Hall effect and photoluminescence spectra.The results show that the Zn_(3)N_(2) films start to transform to ZnO at 300℃ and the N content decreases with an increase in annealing temperature.N has two local chemical states:zinc oxynitride(ZnO_(1-x)N_(x))and substitutional NO in O-rich local environments(α-NO).The conduction type changes from n-type to p-type upon oxidation at 400-600℃,indicating that N is an effective acceptor in the ZnO film.The photoluminescence spectra show the UV emission and defect-related emissions of ZnO:N films.The mechanism and efficiency of p-type doping are briefly discussed.

Thermal Annealing Behavior of Helium in Ti Films Deposited by Magnetron Sputtering

Helium contents of up to 30at.% are prepared in sputter-deposited Ti films.Isochronal annealing behaviors of helium including the depth profiles and the evolution of helium bubbles in the films at different temperatures are examined by ion beam analysis including Rutherford backscattering spectrometry (RBS) and elastic recoil detection analysis (ERDA),as well as thermal helium desorption spectroscopy (THDS).It is found that the energy spreading induced by structural inhomogeneities in the spectra of RBS and ERDA as well as the increment in the width of spectra occurs,which corresponds to the change of stopping cross-section of helium atoms in the Ti film due to the change of physical-state of helium in the evolution of helium bubble.The ion beam analysis on the helium evolution is consistent with the THDS measurement.Ion beam technique opens interesting possibilities in the characterizing on the growth of helium bubbles.

Helium-Related Defect Evolution in Titanium Films by Slow Positron Beam Analysis

Various helium-containing titanium films were deposited on Si substrates by magnetron sputtering under different helium/argon (He/Ar) ambiances.Helium concentrations and corresponding depth profiles in the Ti films are obtained by elastic recoil detection analysis (ERDA).X-ray diffraction (XRD) measurements are carried out to evaluate the crystallization of the titanium films.Vacancy-type defects and their depth profiles were revealed by slow positron beam analysis (SPBA).It is found that the defect-characteristic parameter S rises with the increment of the He/Ar flow ratios.The variation of S indicates the formation and evolution of various Herelated defects,with uniform distribution into the depth around 400nm.

Bias Effects on the Growth of Helium-Containing Titanium Films

Helium-containing titanium films were prepared on Si substrates with various biases applied by magnetron sputtering under stable He/Ar ambiance.Rutherford backscattering and elastic recoil detection analyses are used to measure the thickness of the He-Ti films and the helium depth profile,respectively.Experiments of x-ray diffraction and variable energy positron annihilation spectroscopy are carried out to investigate the microstructures of titanium films and the corresponding helium-related defects developed.The behavior of the implanted He,the microstructure of the He-Ti film and the formation of He-related defects all are affected by the substrate biases applied.

10 kV电力设备的运行维护分析

文章首先从人为因素以及管理因素等方面对10 kV电力设备的运行维护进行了分析,然后从变压器设备的维护与保养、构建现场危险点全面分析体系、电力电容器的维护、高低压变配电设备的维护与保养、干式变压器维护要点、加强运维检修人员教育培训、加强电力运行设备日常保养与维护措施以及科学修订运维检修规程及制度等方面提出了10 kV电力设备的运行维护对策,希望本文的研究对今后的从业工作者有所帮助。