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Direct patterning of reduced graphene oxide/graphene oxide memristive heterostructures by electron-beam irradiation
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作者 Olesya O.Kapitanova Evgeny V.Emelin +4 位作者 Sergey G.Dorofeev Pavel V.Evdokimov Gennady N.Panin Youngmin lee sejoon lee 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2020年第3期237-243,共7页
Memristive heterostructures,composed of reduced graphene oxide with different degree of reduction,were demonstrated through a simple method of‘direct electron-beam writing’on graphene oxide.Irradiation with an elect... Memristive heterostructures,composed of reduced graphene oxide with different degree of reduction,were demonstrated through a simple method of‘direct electron-beam writing’on graphene oxide.Irradiation with an electron beam at various doses and accelerating voltages made it possible to define highand low-conductivity graphene-oxide areas.The electron beam-reduced graphene oxide/graphene oxide heterostructure clearly exhibited a nonlinear behavior and a well-controlled resistive switching characteristic at a low operating-voltage range(<1 V).The proposed memristive heterostructures are promising for highly-efficient digital storage and information process as well as for analogous neuromorphic computations. 展开更多
关键词 Electron beam irradiation Reduced GRAPHENE OXIDE GRAPHENE OXIDE Memristive HETEROSTRUCTURE
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