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Laser trimming for lithography-free fabrications of MoS_(2)devices
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作者 Yong Xie OnurÇakıroğlu +7 位作者 Wenshuai Hu Kexin He sergio puebla Thomas Pucher Qinghua Zhao Xiaohua Ma Carmen Munuera Andres Castellanos-Gomez 《Nano Research》 SCIE EI CSCD 2023年第4期5042-5046,共5页
Single-layer MoS_(2)produced by mechanical exfoliation is usually connected to thicker and multilayer regions.We show a facile laser trimming method to insulate single-layer MoS_(2)regions from thicker ones.We demonst... Single-layer MoS_(2)produced by mechanical exfoliation is usually connected to thicker and multilayer regions.We show a facile laser trimming method to insulate single-layer MoS_(2)regions from thicker ones.We demonstrate,through electrical characterization,that the laser trimming method can be used to pattern single-layer MoS_(2)channels with regular geometry and electrically disconnected from the thicker areas.Scanning photocurrent microscope further confirms that in the as-deposited flake(connected to a multilayer area)most of the photocurrent is being generated in the thicker flake region.After laser trimming,scanning photocurrent microscopy shows how only the single-layer MoS_(2)region contributes to the photocurrent generation.The presented method is a direct-write and lithography-free(no need of resist or wet chemicals)alternative to reactive ion etching process to pattern the flakes that can be easily adopted by many research groups fabricating devices with MoS_(2) and similar twodimensional materials. 展开更多
关键词 2D materials transition metal dichalcogenides laser trimming differential reflectance
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