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Comparison of radiation degradation induced by x-ray and 3-MeV protons in 65-nm CMOS transistors
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作者 丁李利 simone gerardin +3 位作者 Marta Bagatin Dario Bisello Serena Mattiazzo Alessandro Paccagnella 《Chinese Physics B》 SCIE EI CAS CSCD 2016年第9期468-473,共6页
The total ionizing dose(TID) response of 65-nm CMOS transistors is studied by 10-ke V x-ray and 3-Me V protons up to 1 Grad(SiO_2) total dose.The degradation levels induced by the two radiation sources are differe... The total ionizing dose(TID) response of 65-nm CMOS transistors is studied by 10-ke V x-ray and 3-Me V protons up to 1 Grad(SiO_2) total dose.The degradation levels induced by the two radiation sources are different to some extent.The main reason is the interface dose enhancement due to the thin gate oxide and the low energy photons.The holes' recombination also contributes to the difference.Compared to these two mechanisms,the influence of the dose rate is negligible. 展开更多
关键词 total ionizing dose(TID) effects grad dose x-ray and protons 65-nm CMOS transistors
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