Massively parallel direct writing of nanoapertures using multi-optical probes and super-resolution near-fields

Laser direct-writing enables micro and nanoscale patterning,and is thus widely used for cutting-edge research and industrial applications.Various nanolithography methods,such as near-field,plasmonic,and scanning-probe lithography,are gaining increasing attention because they enable fabrication of high-resolution nanopatterns that are much smaller than the wavelength of light.However,conventional methods are limited by low throughput and scalability,and tend to use electron beams or focused-ion beams to create nanostructures.In this study,we developed a procedure for massively parallel direct writing of nanoapertures using a multi-optical probe system and superresolution near-fields.A glass micro-Fresnel zone plate array,which is an ultra-precision far-field optical system,was designed and fabricated as the multi-optical probe system.As a chalcogenide phase-change material(PCM),multiple layers of Sb_(65)Se_(35) were used to generate the super-resolution near-field effect.A nanoaperture was fabricated through direct laser writing on a large-area(200×200mm^(2))multi-layered PCM.A photoresist nanopattern was fabricated on an 8-inch wafer via near-field nanolithography using the developed nanoaperture and an i-line commercial exposure system.Unlike other methods,this technique allows high-throughput large-area nanolithography and overcomes the gap-control issue between the probe array and the patterning surface.