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Large-signal characterizations of DDR IMPATT devices based on group Ⅲ–Ⅴ semiconductors at millimeter-wave and terahertz frequencies 被引量:2
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作者 Aritra Acharyya Aliva Mallik +4 位作者 Debopriya Banerjee suman ganguli Arindam Das Sudeepto Dasgupta J.P.Banerjee 《Journal of Semiconductors》 EI CAS CSCD 2014年第8期69-78,共10页
Large-signal (L-S) characterizations of double-drift region (DDR) impact avalanche transit time (IM- PATT) devices based on group III-V semiconductors such as wurtzite (Wz) GaN, GaAs and InP have been carried ... Large-signal (L-S) characterizations of double-drift region (DDR) impact avalanche transit time (IM- PATT) devices based on group III-V semiconductors such as wurtzite (Wz) GaN, GaAs and InP have been carried out at both millimeter-wave (mm-wave) and terahertz (THz) frequency bands. A L-S simulation technique based on a non-sinusoidal voltage excitation (NSVE) model developed by the authors has been used to obtain the high frequency properties of the above mentioned devices. The effect of band-to-band tunneling on the L-S properties of the device at different mm-wave and THz frequencies are also investigated. Similar studies are also carried out for DDR IMPATTs based on the most popular semiconductor material, i.e. Si, for the sake of comparison. A compara- tive study of the devices based on conventional semiconductor materials (i.e. GaAs, InP and Si) with those based on Wz-GaN shows significantly better performance capabilities of the latter at both mm-wave and THz frequencies. 展开更多
关键词 DDR IMPATTs GaN group Ⅲ-Ⅴ large-signal simulation MILLIMETER-WAVE terahertz regime WURTZITE
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