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Influence of Thickness on the Photosensing Properties of Chemically Synthesized Copper Sulfide Thin Films
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作者 Abhiman Dattatray Dhondge sunil rameshgir gosavi +4 位作者 Narayani Madhukar gosavi Chatur Pundlik Sawant Amar Maruti Patil Abhijeet Ravsaheb Shelke Nishad Gopal Deshpande 《World Journal of Condensed Matter Physics》 2015年第1期1-9,共9页
We report here the influence of thickness on the photosensing properties of copper sulfide (CuS) thin films. The CuS films were deposited onto glass substrate by using a simple and cost effective chemical bath deposit... We report here the influence of thickness on the photosensing properties of copper sulfide (CuS) thin films. The CuS films were deposited onto glass substrate by using a simple and cost effective chemical bath deposition method. The changes in film thickness as a function of time were monitored. The films were characterized using X-ray diffraction technique (XRD), field emission scanning electron microscopy (FE-SEM), optical measurement techniques and electrical measurement. X-ray diffraction results indicate that all the CuS thin films have an orthorhombic (covellite) structure with preferential orientation along (113) direction. The intensity of the diffraction peaks increases as thickness of the film increases. Uniform deposition having nanocrystalline granular morphology distributed over the entire glass substrate was observed through FE-SEM studies. The crystalline and surface properties of the CuS thin films improved with increase in the film thickness. Transmittance (except for 210 nm thick CuS film) together with band gap values was found to decrease with increase in thickness. I-V measurements under dark and illumination condition show that the CuS thin films give a good photoresponse. 展开更多
关键词 Copper SULFIDE (CuS) Chemical BATH Deposition (CBD) Thin Film X-Ray Diffraction (XRD) Field Emission Scanning Electron Microscopy (FESEM) PHOTOSENSITIVITY
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