This review summarizes the mechanism and performance of metal oxide based resistive switching memory. The origin of resistive switching （RS） behavior can be roughly classified into the conducting filament type and t...This review summarizes the mechanism and performance of metal oxide based resistive switching memory. The origin of resistive switching （RS） behavior can be roughly classified into the conducting filament type and the interface type. Here, we adopt the filament type to study the metal oxide based resistive switch- ing memory, which considers the migration of metallic cations and oxygen vacancies, as well as discuss two main mechanisms including the electrochemical metallization effect （ECM） and valence change memory effect （VCM）. At the light of the influence of the electrode materials and switching layers on the RS char- acteristics, an overview has also been given on the performance parameters including the uniformity, endurance, the retention, and the multi-layer storage. Especially, we mentioned ITO （indium tin oxide） electrode and discussed the novel RS characteristics related with ITO. Finally, the challenges resistive random access memory （RRAM） device is facing, as well as the future development trend, are expressed.展开更多
基金financial support from the National Natural Science Foundation of China(Nos.61474039 and 51572002)the Nature Science Foundation(Key Project) of Hubei Province (No.2015CFA052)
文摘This review summarizes the mechanism and performance of metal oxide based resistive switching memory. The origin of resistive switching （RS） behavior can be roughly classified into the conducting filament type and the interface type. Here, we adopt the filament type to study the metal oxide based resistive switch- ing memory, which considers the migration of metallic cations and oxygen vacancies, as well as discuss two main mechanisms including the electrochemical metallization effect （ECM） and valence change memory effect （VCM）. At the light of the influence of the electrode materials and switching layers on the RS char- acteristics, an overview has also been given on the performance parameters including the uniformity, endurance, the retention, and the multi-layer storage. Especially, we mentioned ITO （indium tin oxide） electrode and discussed the novel RS characteristics related with ITO. Finally, the challenges resistive random access memory （RRAM） device is facing, as well as the future development trend, are expressed.
