The atomic structure and surface chemistry of GaP/Si(100)heterostructure with different pre-layers grown by molecu-lar beam epitaxy are studied.It is found that GaP epilayer with Ga-riched pre-layers on Si(100)substra...The atomic structure and surface chemistry of GaP/Si(100)heterostructure with different pre-layers grown by molecu-lar beam epitaxy are studied.It is found that GaP epilayer with Ga-riched pre-layers on Si(100)substrate has regular surface mor-phology and stoichiometric abrupt heterointerfaces from atomic force microscopes(AFMs)and spherical aberration-corrected transmission electron microscopes(ACTEMs).The interfacial dynamics of GaP/Si(100)heterostructure is investigated by X-ray photoelectron spectroscopy(XPS)equipped with an Ar gas cluster ion beam,indicating that Ga pre-layers can lower the inter-face formation energy and the bond that is formed is more stable.These results suggest that Ga-riched pre-layers are more con-ducive to the GaP nucleation as well as the epitaxial growth of GaP material on Si(100)substrate.展开更多
基金supported in part by the National Key R&D Program(Grant No.2018YFB2003305)the National Natural Science Foundation of China(Grant Nos.61774165,61704186,and 61827823)the program from SINANO(Y8AAQ11003 and Y4JAQ21005)。
文摘The atomic structure and surface chemistry of GaP/Si(100)heterostructure with different pre-layers grown by molecu-lar beam epitaxy are studied.It is found that GaP epilayer with Ga-riched pre-layers on Si(100)substrate has regular surface mor-phology and stoichiometric abrupt heterointerfaces from atomic force microscopes(AFMs)and spherical aberration-corrected transmission electron microscopes(ACTEMs).The interfacial dynamics of GaP/Si(100)heterostructure is investigated by X-ray photoelectron spectroscopy(XPS)equipped with an Ar gas cluster ion beam,indicating that Ga pre-layers can lower the inter-face formation energy and the bond that is formed is more stable.These results suggest that Ga-riched pre-layers are more con-ducive to the GaP nucleation as well as the epitaxial growth of GaP material on Si(100)substrate.
