The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits wi...The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. The good prospects of the EUV and soft X-rays for next generation lithography systems (λ=13.5 nm), microscopy in the “water window” (λ=2.3～4.4 nm), astronomy (λ=5～31 nm), spectroscopy, plasma diagnostics and EUV/soft X-ray laser research have led to considerable progress in the development of different multilayer optics. Since optical systems in the EUV/soft X-ray spectral region consist of several mirror elements a maximum reflectivity of each multilayer is essential for a high throughput. This paper covers recent results of the enhanced spectral behavior of Mo/Si, Cr/Sc and Sc/Si multilayer optics.展开更多
New applications in optoelectronics, photonics, telecommunication, displays, optical data processing, biomedicine, sensors, energy control, automobile, aerospace, and architecture stimulation are important development...New applications in optoelectronics, photonics, telecommunication, displays, optical data processing, biomedicine, sensors, energy control, automobile, aerospace, and architecture stimulation are important developments in physics and technology of optical coatings. This paper will focus on the latest advances in the areas of new optical film systems and devices, new optical coating materials and film fabrication techniques, process control and monitoring, and different advanced applications. Particularly, focus is on optical films that combine optical design with microstructural features tailored on the nanometer and micrometer scales. Evaluation of film stability and integrity in harsh industrial environments and their compatibility with organic polymers are important as well.展开更多
文摘The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. The good prospects of the EUV and soft X-rays for next generation lithography systems (λ=13.5 nm), microscopy in the “water window” (λ=2.3～4.4 nm), astronomy (λ=5～31 nm), spectroscopy, plasma diagnostics and EUV/soft X-ray laser research have led to considerable progress in the development of different multilayer optics. Since optical systems in the EUV/soft X-ray spectral region consist of several mirror elements a maximum reflectivity of each multilayer is essential for a high throughput. This paper covers recent results of the enhanced spectral behavior of Mo/Si, Cr/Sc and Sc/Si multilayer optics.
文摘New applications in optoelectronics, photonics, telecommunication, displays, optical data processing, biomedicine, sensors, energy control, automobile, aerospace, and architecture stimulation are important developments in physics and technology of optical coatings. This paper will focus on the latest advances in the areas of new optical film systems and devices, new optical coating materials and film fabrication techniques, process control and monitoring, and different advanced applications. Particularly, focus is on optical films that combine optical design with microstructural features tailored on the nanometer and micrometer scales. Evaluation of film stability and integrity in harsh industrial environments and their compatibility with organic polymers are important as well.
