Nanocomposite Ti-Si-N thin films have been deposited on Si （100） substrate by direct current/radio frequency （DC/RF） magnetron sputtering. The effect of varying deposition parameters on the structure and mechanica...Nanocomposite Ti-Si-N thin films have been deposited on Si （100） substrate by direct current/radio frequency （DC/RF） magnetron sputtering. The effect of varying deposition parameters on the structure and mechanical properties of Ti-Si-N films has been investigated by characterization techniques such as X-ray dif- fraction （XRD）, field emission scanning electron microscopy （FE-SEM）, atomic force microscopy （AFM） and nanoindentation, respectively. XRD analysis of the thin films exhibit all （111）, （200） and （220） peaks initially with varying sputtering pressure, but （111） peak dominates at higher sputtering pressure. The crystallite size calculated from XRD peaks shows that it increases with increasing sputtering pressure. Microstructural analy- sis reveals that the dense blurred grains transform into uniform grains in the films and shows porosity with increasing sputtering pressure. The surface roughness of the Ti-Si-N films increases with varying sputtering pressure. The hardness and Youngrs modulus values of Ti-Si-N films are 33.7 and 278.6 GPa, respectively, with 0.7 Pa sputtering pressure but it decreases with further increase in sputtering pressure due to an increase in porosity of the films.展开更多
The influence of sputtering gas（He Ar） on the structural properties of Mg thin films has been investigated.The optical property（reflectance） that results from the growth of films at varying substrate temperatures...The influence of sputtering gas（He Ar） on the structural properties of Mg thin films has been investigated.The optical property（reflectance） that results from the growth of films at varying substrate temperatures（Tsub） was also studied.The deposited films were characterized by using X-ray diffraction（XRD）,field emission scaning electron microscopy（FE-SEM）,atomic force microscopy（AFM） and UV-Vis-NIR spectrophotometer.The smaller crystallite size and lower deposition rate were observed in the presence of Helium atmosphere compared to Argon.Morphology of the films shows 2D hexagonal geometry of grains in the deposition temperature range（Tsub≈50-150℃） in both the sputtering gases.The surface roughness of the polycrystalline films were found to increase with increase in the deposition temperature of both ambient gases.Optical reflectance of Mg films was measured in near infrared region and larger reflectance was observed from Mg films sputtered in He atmosphere compared to that in argon.展开更多
文摘Nanocomposite Ti-Si-N thin films have been deposited on Si （100） substrate by direct current/radio frequency （DC/RF） magnetron sputtering. The effect of varying deposition parameters on the structure and mechanical properties of Ti-Si-N films has been investigated by characterization techniques such as X-ray dif- fraction （XRD）, field emission scanning electron microscopy （FE-SEM）, atomic force microscopy （AFM） and nanoindentation, respectively. XRD analysis of the thin films exhibit all （111）, （200） and （220） peaks initially with varying sputtering pressure, but （111） peak dominates at higher sputtering pressure. The crystallite size calculated from XRD peaks shows that it increases with increasing sputtering pressure. Microstructural analy- sis reveals that the dense blurred grains transform into uniform grains in the films and shows porosity with increasing sputtering pressure. The surface roughness of the Ti-Si-N films increases with varying sputtering pressure. The hardness and Youngrs modulus values of Ti-Si-N films are 33.7 and 278.6 GPa, respectively, with 0.7 Pa sputtering pressure but it decreases with further increase in sputtering pressure due to an increase in porosity of the films.
基金by DRDO,Govt. of India (Grant No.ERIP/ER/0800354/M/01/1125)
文摘The influence of sputtering gas（He Ar） on the structural properties of Mg thin films has been investigated.The optical property（reflectance） that results from the growth of films at varying substrate temperatures（Tsub） was also studied.The deposited films were characterized by using X-ray diffraction（XRD）,field emission scaning electron microscopy（FE-SEM）,atomic force microscopy（AFM） and UV-Vis-NIR spectrophotometer.The smaller crystallite size and lower deposition rate were observed in the presence of Helium atmosphere compared to Argon.Morphology of the films shows 2D hexagonal geometry of grains in the deposition temperature range（Tsub≈50-150℃） in both the sputtering gases.The surface roughness of the polycrystalline films were found to increase with increase in the deposition temperature of both ambient gases.Optical reflectance of Mg films was measured in near infrared region and larger reflectance was observed from Mg films sputtered in He atmosphere compared to that in argon.
