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Soft thermal nanoimprint lithography using a nanocomposite mold 被引量:6
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作者 viraj bhingardive Liran Menahem Mark Schvartzman 《Nano Research》 SCIE EI CAS CSCD 2018年第5期2705-2714,共10页
Soft nanoimprint lithography has been limited to ultraviolet (UV) curable resists. Here, we introduce a novel approach for soft thermal nanoimprinting. This unprecedented combination of the terms "soft" and "ther... Soft nanoimprint lithography has been limited to ultraviolet (UV) curable resists. Here, we introduce a novel approach for soft thermal nanoimprinting. This unprecedented combination of the terms "soft" and "thermal" for nanoimprinting became possible thanks to an innovative nanocomposite mold consisting of a flexible polydimethylsiloxane (PDMS) substrate with chemically attached rigid relief features. We used soft thermal nanoimprinting to produce high-resolution nanopatterns with a sub-100 nm feature size. Furthermore, we demonstrate the applicability of our nanoimprint approach for the nanofabrication of thermally imprinted nanopattems on non-planar surfaces such as lenses. Our new nanofabrication strategy paves the way to numerous applications that require the direct fabrication of functional nanostructures on unconventional substrates. 展开更多
关键词 soft lithography nanoimprint lithography polydimethylsiloxane(PDMS) non-planar substrates
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