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OH Diffusion in Silica Glass Preform During Jacketing Process by Oxy-Hydrogen Burner
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作者 B.H.Kim S.R.han +2 位作者 U. C.Paek w.-t.han S. K.Oh 《光学学报》 EI CAS CSCD 北大核心 2003年第S1期76-77,共2页
Radial distribution of OH diffusion in silica glass preform during jacketing process using a oxy-hydrogen burner was investigated by FTIR spectroscopy. The OH peaks at the jacketing boundary and the surface of the pre... Radial distribution of OH diffusion in silica glass preform during jacketing process using a oxy-hydrogen burner was investigated by FTIR spectroscopy. The OH peaks at the jacketing boundary and the surface of the preform were found to be due to diffusion of OH incorporated from the burner. 展开更多
关键词 OH Diffusion in Silica Glass Preform During Jacketing Process by Oxy-Hydrogen Burner on for by MCVD in
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