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Effect of Annealing Duration and Substrates on Structure and Property of Vanadium Dioxide Films
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作者 储新宏 TAO Haizheng +4 位作者 wan meinan wanG Shuo NING Zhiyong XU Na 赵修建 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2014年第6期1117-1123,共7页
Using the oxidation method from vanadium metal thin films by magnetron sputtering, under the fixed annealing parameters of temperature(400 ℃) and oxygen pressure(103 Pa), we fabricated a series of vanadium dioxid... Using the oxidation method from vanadium metal thin films by magnetron sputtering, under the fixed annealing parameters of temperature(400 ℃) and oxygen pressure(103 Pa), we fabricated a series of vanadium dioxide thin films through the change of annealing durations or substrates(quartz glass or AZOcovered glass). Characterization of the thermochromic properties together with the X-ray diffraction(XRD) and field emission scanning electron microscopy(FE-SEM) indicates that appropriate annealing duration is a key factor to obtain pure VO2 films and AZO-covered glass is more suitable to obtain the VO2 films with high visible transmittance, good crystallinity and larger near-infrared switching efficiencies(maximum 34% at 2000 nm) compared with the substrate of quartz glass. However, VO2 films on quartz glass exhibit narrower loop(7 ℃) with smart reversible response to temperature. Depth profile XPS spectra further indicate that for the films fabricated on quartz glass from thicker V metal films, the existence of low valence vanadium oxides is inevitable and leads to a lower transmittance in the region of visible light. 展开更多
关键词 VO2 magnetron sputtering oxidation quartz glass AZO thermal hysteresis loop
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