Fluorine doped silicon dioxide (SiOF) thin films have been prepared by plasma enhanced chemical vapor deposition. The Fourier transform infrared spectrometry (FTIR) spectra of SiOF films are deliberated to reveal the ...Fluorine doped silicon dioxide (SiOF) thin films have been prepared by plasma enhanced chemical vapor deposition. The Fourier transform infrared spectrometry (FTIR) spectra of SiOF films are deliberated to reveal the structure change of SiO_(2) and the mechanism of dielectric constant reduction after doping fluorine. When F is doped in SiO_(2) films, the Si-O stretching absorption peak will have a blue-shift due to increase of the partial charge of the O atom. The FTIR spectra indicate that some Si-OH components in the thin film can be removed after doping fluorine. These changes reduce the ionic and orientational polarization, and result in the reduction in dielectric constant of the film. According to Gaussian fitting, it is found that the Si-F2 bonds will appear in the SiOF film with increase of the fluorine content. The Si-F2 structures are liable to react with water, and cause the same increase of absorbed moisture in the film.展开更多
The reaction of 1-phenacylimidazole with W（CO）6 in a 1：1 molar ratio under irradiation with a high-pressure Hg lamp mainly yielded the title compound （C29H26N4O7W, Mr = 726.39）, which is of orthorhombic, space gr...The reaction of 1-phenacylimidazole with W（CO）6 in a 1：1 molar ratio under irradiation with a high-pressure Hg lamp mainly yielded the title compound （C29H26N4O7W, Mr = 726.39）, which is of orthorhombic, space group Pbca with a = 27.665（4）, b = 7.7807（12）, c = 27.803（4） A, V = 5984.8（16）A^3, Z = 8, Dc = 1.612 g/cm^3, λ（MoKa） = 0.71073 A ,μ= 3.911 mm^-1, F（000） = 2864, R = 0.0583 and wR = 0.1502 for 3356 observed reflections （I 〉 2σ（I））. The crystal structural analysis indicates that in the coordination geometry of tungsten, 1-phenacylimidazole acts as a monodentate ligand and two imidazole ligands locate in a cis-position.展开更多
基金Supported by the National Natural Science Foundation of China under Grant No.69776026.
文摘Fluorine doped silicon dioxide (SiOF) thin films have been prepared by plasma enhanced chemical vapor deposition. The Fourier transform infrared spectrometry (FTIR) spectra of SiOF films are deliberated to reveal the structure change of SiO_(2) and the mechanism of dielectric constant reduction after doping fluorine. When F is doped in SiO_(2) films, the Si-O stretching absorption peak will have a blue-shift due to increase of the partial charge of the O atom. The FTIR spectra indicate that some Si-OH components in the thin film can be removed after doping fluorine. These changes reduce the ionic and orientational polarization, and result in the reduction in dielectric constant of the film. According to Gaussian fitting, it is found that the Si-F2 bonds will appear in the SiOF film with increase of the fluorine content. The Si-F2 structures are liable to react with water, and cause the same increase of absorbed moisture in the film.
基金This work was supported by the National Natural Science Foundation of China (Nos. 20472037 and 20421202), the Ministry of Education (NCET-04-0227) and the Research Fund of Yibin University
文摘The reaction of 1-phenacylimidazole with W（CO）6 in a 1：1 molar ratio under irradiation with a high-pressure Hg lamp mainly yielded the title compound （C29H26N4O7W, Mr = 726.39）, which is of orthorhombic, space group Pbca with a = 27.665（4）, b = 7.7807（12）, c = 27.803（4） A, V = 5984.8（16）A^3, Z = 8, Dc = 1.612 g/cm^3, λ（MoKa） = 0.71073 A ,μ= 3.911 mm^-1, F（000） = 2864, R = 0.0583 and wR = 0.1502 for 3356 observed reflections （I 〉 2σ（I））. The crystal structural analysis indicates that in the coordination geometry of tungsten, 1-phenacylimidazole acts as a monodentate ligand and two imidazole ligands locate in a cis-position.
