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Magnetoresistance of the thin film ferromagnetic nanoconstrictions 被引量:2
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作者 CHENG Hao YANG Wei +1 位作者 LIU Hong wang lingjiang 《Chinese Science Bulletin》 SCIE CAS 2012年第5期445-449,共5页
The magnetoresistance and I-V characteristics at different temperatures of the thin film ferromagnetic nanoconstrictions of variable width (from 20 to 250 nm) and 10 nm thicknesses, fabricated by electron beam lithogr... The magnetoresistance and I-V characteristics at different temperatures of the thin film ferromagnetic nanoconstrictions of variable width (from 20 to 250 nm) and 10 nm thicknesses, fabricated by electron beam lithography and vacuum thin film deposition are compared. The magnetoresistance and resistance of the thin film ferromagnetic nanoconstrictions are not related to the width of the nanoconstrictions. Instead the resistance of the local nano-region in the middle of the thin film ferromagnetic nanoconstriction has only a minor role compared to that of the two microscale thin film ferromagnetic electrodes, which contribute the majority of the measured resistance. The magnetoresistances of the thin film ferromagnetic nanoconstrictions and a 0.2 cm × 0.8 cm thin ferromagnetic film deposited under the same conditions were also compared; the thin film ferromagnetic nanoconstrictions have higher magnetoresistances than the thin ferromagnetic film, which implies that the measured magnetoresistance of the thin film ferromagnetic nanoconstrictions comes mainly from the local nano-region in their centers. In conclusion, the measured magnetoresistance of the whole sample is similar to the anisotropic magnetoresistance, because the resistance of the two microscale thin film ferromagnetic electrodes is much higher than that of the local nano-region in the middle of the samples. Comparing the experimental results for the thin film ferromagnetic nanoconstrictions and the thin ferromagnetic film reveals that the magnetoresistance of the local nano-region in the middle of the sample is much higher than that of the two microscale thin film ferromagnetic electrodes attached to it. 展开更多
关键词 铁磁电极 薄膜沉积 磁阻 电阻薄膜 磁电阻比 铁磁薄膜 电子束光刻 磁各向异性
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Magnetoresistance of the ferromagnetic nanocontacts fabricated by electrodeposition
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作者 CHENG Hao YANG Wei +2 位作者 LIU Hong LI HongLian wang lingjiang 《Chinese Science Bulletin》 SCIE EI CAS 2013年第6期598-602,共5页
A "T" shaped micro-gap was fabricated by mechanical polishing between two Cu film electrodes on the surface of single-sided bonded copper.A nano-gap was then fabricated in the prepared micro-gap by resistanc... A "T" shaped micro-gap was fabricated by mechanical polishing between two Cu film electrodes on the surface of single-sided bonded copper.A nano-gap was then fabricated in the prepared micro-gap by resistance feedback controlled electroplating.Finally Ni 80 Fe 20 ferromagnetic nanocontacts of several sizes were fabricated in the prepared nano-gap by resistance feedback controlled electroplating.The magnetoresistance of each Ni 80 Fe 20 ferromagnetic nanocontact was not related to its size.Fabrication of the Ni 80 Fe 20 ferromagnetic nanocontacts in the nano-gap can reduce the contribution of magnetostriction to the magnetoresistance.The magnetoresistance values of the Ni 80 Fe 20 ferromagnetic nanocontacts were as high as those of the Ni ferromagnetic nanocontacts.This implies that the contribution of magnetostriction to the ballistic magnetoresistance of the ferromagnetic nanocontacts can be neglected.The ferromagnetic nanocontacts fabricated in this study,and in other cases,have two anisotropic interfaces on the sides of the nanocontacts.However,the magnetic field can alter the contribution of the interaction between the two anisotropic interfaces to the ballistic magnetoresistance of the ferromagnetic nanocontacts,and this effect can not be ruled out yet. 展开更多
关键词 铁磁 制造 反馈电阻 反馈控制 磁致伸缩 各向异性 小间隙 机械抛光
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