This paper reports the fabrication and properties of small Nb-(a-Si)-Nb-(a-Si)-Nb Josephson tunnel junctions.The smallest junction area is about 0.3μm^(2).A thin a-Si film deposited by electron beam evaporation was o...This paper reports the fabrication and properties of small Nb-(a-Si)-Nb-(a-Si)-Nb Josephson tunnel junctions.The smallest junction area is about 0.3μm^(2).A thin a-Si film deposited by electron beam evaporation was oxidized and used for the tunnel barriers.TEM and XPS investigations indicate that the barrier layers consist of SiOx and Si.The junctions have been used for RF SQUID with an energy resolution of 1.9×l0^(-28) J/Hz.展开更多
文摘This paper reports the fabrication and properties of small Nb-(a-Si)-Nb-(a-Si)-Nb Josephson tunnel junctions.The smallest junction area is about 0.3μm^(2).A thin a-Si film deposited by electron beam evaporation was oxidized and used for the tunnel barriers.TEM and XPS investigations indicate that the barrier layers consist of SiOx and Si.The junctions have been used for RF SQUID with an energy resolution of 1.9×l0^(-28) J/Hz.
