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Analysis and Simulation of S-shaped Waveguide in Silicon-on-insulator 被引量:1
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作者 wangzhang-tao fanzhong-cao xiajin-song chenshao-wu yujinzhong 《Semiconductor Photonics and Technology》 CAS 2004年第2期78-81,共4页
The simulation and analysis of S-shaped waveguide bend are presented.Bend radius larger than 30 mm assures less than 0.5 dB radiation loss for a 4-μm-wide silicon-on-insulator waveguide bend with 2-μm etch depth.Int... The simulation and analysis of S-shaped waveguide bend are presented.Bend radius larger than 30 mm assures less than 0.5 dB radiation loss for a 4-μm-wide silicon-on-insulator waveguide bend with 2-μm etch depth.Intersection angle greater than 20° provides negligible crosstalk (<-30 dB) and very low insertion loss.Any reduction in bend radius and intersection angle is at the cost of the degradation of characteristics of bent waveguide and intersecting waveguide, respectively. 展开更多
关键词 BPM S-shaped bend SILICON-ON-INSULATOR
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