To generate optical vortex with multiple topological charges,a simple scheme based on the phase mask shaping technique is proposed and applied in a seeded free electron laser.With a tailored phase mask,an extreme-ultr...To generate optical vortex with multiple topological charges,a simple scheme based on the phase mask shaping technique is proposed and applied in a seeded free electron laser.With a tailored phase mask,an extreme-ultraviolet(EUV)vortex with multiple topological charges can be produced.To prove the feasibility of this method,an eight-step phase mask is designed to shape the seed laser.The simulation results demonstrate that 100-MW,fully coherent EUV vortex pulses with topological charge 2 can be generated based on the proposed technique.We have also demonstrated the possibility of generating higher topological charges by using a phase mask with more steps.展开更多
基金supported by the National Natural Science Foundation of China(Nos.12122514 and 11975300)Shanghai Science and Technology Committee Rising-Star Program(No.20QA1410100)。
文摘To generate optical vortex with multiple topological charges,a simple scheme based on the phase mask shaping technique is proposed and applied in a seeded free electron laser.With a tailored phase mask,an extreme-ultraviolet(EUV)vortex with multiple topological charges can be produced.To prove the feasibility of this method,an eight-step phase mask is designed to shape the seed laser.The simulation results demonstrate that 100-MW,fully coherent EUV vortex pulses with topological charge 2 can be generated based on the proposed technique.We have also demonstrated the possibility of generating higher topological charges by using a phase mask with more steps.
