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Amorphous phase stability of NbTiAlSiNx high-entropy films 被引量:6
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作者 wen-jie sheng Xiao Yang +2 位作者 Jie Zhu Cong Wang Yong Zhang 《Rare Metals》 SCIE EI CAS CSCD 2018年第8期682-689,共8页
In this study, high-entropy films with the compo- sition of NbTiA1SiNx were prepared by a reactive direct current (DC) magnetron sputtering technique, with different nitrogen flow rates (0, 4 and 8 ml.min^-1). The... In this study, high-entropy films with the compo- sition of NbTiA1SiNx were prepared by a reactive direct current (DC) magnetron sputtering technique, with different nitrogen flow rates (0, 4 and 8 ml.min^-1). The microstructures and properties were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), high-resolution transmission electron microscopy (HRTEM), nano-indenter and spectrophotometer. All of the as-deposited NbTiA1SiNx films are shown to have an amorphous structure, and the films exhibit high thermal stability up to 700℃. The maximum hardness and modulus values of the films reach 20.5 GPa (4 ml.min-1) and 206.8 GPa (0 ml.min^-l), respectively. The films exhibit high absorption of the solar energy in the wavelength of 0.3-2.5 pm, which indicates that NbTiA1SiNx nitride film is a potential candidate solar selective absorbing coating for high-temperature photo-thermal conversion in the concentrated solar power project. 展开更多
关键词 High-entropy film SPUTTERING AMORPHOUS Photo-thermal conversion Phase stability
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