A new reactive magnetron sputtering system enhanced by the faced microwave electron cyclotron resonance plasma source was designed and amorphous CN_(x) films has been prepared by using this system.The character izatio...A new reactive magnetron sputtering system enhanced by the faced microwave electron cyclotron resonance plasma source was designed and amorphous CN_(x) films has been prepared by using this system.The character ization of the films by interference microscopy,atomic force microscopy,and x-ray photoelectron spectroscopy shows that the deposition rate is strongly affected by the direct-current bias,and the films are composed by a single carbon nitride phase and the N/C ratio is 4:3.2,which is close to that of C_(3)N_(4)(4:3).展开更多
基金Supported by the National Natural Science Foundation of China under Grant No.19835030.
文摘A new reactive magnetron sputtering system enhanced by the faced microwave electron cyclotron resonance plasma source was designed and amorphous CN_(x) films has been prepared by using this system.The character ization of the films by interference microscopy,atomic force microscopy,and x-ray photoelectron spectroscopy shows that the deposition rate is strongly affected by the direct-current bias,and the films are composed by a single carbon nitride phase and the N/C ratio is 4:3.2,which is close to that of C_(3)N_(4)(4:3).
