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Integration of high-performance spin-orbit torque MRAM devices by 200-mm-wafer manufacturing platform 被引量:2
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作者 Hongchao Zhang Xiangyue Ma +14 位作者 Chuanpeng Jiang Jialiang Yin Shuqin Lyu Shiyang Lu xiantao shang Bowen Man Cong Zhang Dandan Li Shuhui Li Wenjing Chen Hongxi Liu Gefei Wang Kaihua Cao Zhaohao Wang Weisheng Zhao 《Journal of Semiconductors》 EI CAS CSCD 2022年第10期64-72,共9页
We demonstrate in-plane field-free-switching spin-orbit torque(SOT)magnetic tunnel junction(MTJ)devices that are capable of low switching current density,fast speed,high reliability,and,most importantly,manufactured u... We demonstrate in-plane field-free-switching spin-orbit torque(SOT)magnetic tunnel junction(MTJ)devices that are capable of low switching current density,fast speed,high reliability,and,most importantly,manufactured uniformly by the 200-mm-wafer platform.The performance of the devices is systematically studied,including their magnetic properties,switch-ing behaviors,endurance and data retention.The successful integration of SOT devices within the 200-mm-wafer manufactur-ing platform provides a feasible way to industrialize SOT MRAMs.It is expected to obtain excellent performance of the devices by further optimizing the MTJ film stacks and the corresponding fabrication processes in the future. 展开更多
关键词 SOT MTJ low switching current densities 200-mm-wafer platform ENDURANCE data retention
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