Monoclinic gallium oxide(Ga_2O_3) has been grown on(0001) sapphire(Al_2O_3) substrate by plasma-assisted molecular beam epitaxy(PA-MBE). The epitaxial relationship has been confirmed to be [010]( 2ˉ01) β-Ga_2O_3||[ ...Monoclinic gallium oxide(Ga_2O_3) has been grown on(0001) sapphire(Al_2O_3) substrate by plasma-assisted molecular beam epitaxy(PA-MBE). The epitaxial relationship has been confirmed to be [010]( 2ˉ01) β-Ga_2O_3||[ 011ˉ0](0001)Al_2O_3 via in-situ reflection high energy electron diffraction(RHEED) monitoring and ex-situ X-ray diffraction(XRD) measurement. Crystalline quality is improved and surface becomes flatter with increasing growth temperature, with a best full width at half maximum(FWHM) of XRD ω-rocking curve of( 2ˉ01) plane and root mean square(RMS) roughness of 0.68° and 2.04 nm for the sample grown at 730 °C,respectively. Room temperature cathodoluminescence measurement shows an emission at ～417 nm, which is most likely originated from recombination of donor–acceptor pair(DAP).展开更多
Near-infrared stimulated emission from a high-quality InN layer under optical pumping was observed with a threshold excitation power density of 0.3 and 4 kW cm^(−2) at T=8 and 77 K,respectively.To achieve such a low t...Near-infrared stimulated emission from a high-quality InN layer under optical pumping was observed with a threshold excitation power density of 0.3 and 4 kW cm^(−2) at T=8 and 77 K,respectively.To achieve such a low threshold power density,vicinal GaN substrates were used to reduce the edge-component threading dislocation(ETD)density of the InN film.Cross-sectional transmission electron microscopy images reveal that the annihilation of ETDs can be divided into two steps,and the ETD density can be reduced to approximately 5×10^(8) cm^(−2) near the surface of the 5-μm-thick film.The well-resolved phonon replica of the band-to-band emission in the photoluminescence spectra at 9 K confirm the high quality of the InN film.As a result,the feasibility of InN-based photonic structures and the underlying physics of their growth and emission properties are demonstrated.展开更多
基金supported by the National Key R&D Program of China(No.2018YFB0406502)the National Natural Science Foundation of China(Nos.61734001,61521004)
文摘Monoclinic gallium oxide(Ga_2O_3) has been grown on(0001) sapphire(Al_2O_3) substrate by plasma-assisted molecular beam epitaxy(PA-MBE). The epitaxial relationship has been confirmed to be [010]( 2ˉ01) β-Ga_2O_3||[ 011ˉ0](0001)Al_2O_3 via in-situ reflection high energy electron diffraction(RHEED) monitoring and ex-situ X-ray diffraction(XRD) measurement. Crystalline quality is improved and surface becomes flatter with increasing growth temperature, with a best full width at half maximum(FWHM) of XRD ω-rocking curve of( 2ˉ01) plane and root mean square(RMS) roughness of 0.68° and 2.04 nm for the sample grown at 730 °C,respectively. Room temperature cathodoluminescence measurement shows an emission at ～417 nm, which is most likely originated from recombination of donor–acceptor pair(DAP).
基金partially supported by the National Natural Sci-ence Foundation of China(Grants No.61734001,61774004 and 61904002)the Beijing Outstanding Young Scientist Program(Grant No.BJJWZYJH0120191000103)the Science Challenge Project(Grant No.TZ2018003).
文摘Near-infrared stimulated emission from a high-quality InN layer under optical pumping was observed with a threshold excitation power density of 0.3 and 4 kW cm^(−2) at T=8 and 77 K,respectively.To achieve such a low threshold power density,vicinal GaN substrates were used to reduce the edge-component threading dislocation(ETD)density of the InN film.Cross-sectional transmission electron microscopy images reveal that the annihilation of ETDs can be divided into two steps,and the ETD density can be reduced to approximately 5×10^(8) cm^(−2) near the surface of the 5-μm-thick film.The well-resolved phonon replica of the band-to-band emission in the photoluminescence spectra at 9 K confirm the high quality of the InN film.As a result,the feasibility of InN-based photonic structures and the underlying physics of their growth and emission properties are demonstrated.
