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单侧唇裂鼻畸形整复的研究进展
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作者 罗小华 张正文 《Chinese Journal Of Plastic and Reconstructive Surgery》 2019年第1期36-42,F0003,共8页
The cleft lip nasal deformity accounts for 84% of nasal deformities, which is one of the most common diseases in plastic surgery. The Unilateral cleft lip nasal deformity ,which has a high incidence,had many treatment... The cleft lip nasal deformity accounts for 84% of nasal deformities, which is one of the most common diseases in plastic surgery. The Unilateral cleft lip nasal deformity ,which has a high incidence,had many treatments but not very effective.In this article, we will focus on the repair of unilateral cleft lip nasal deformity, embryology and etiology, anatomy and pathology, classification, preoperative evaluation and repair timing strategies, surgical goals and surgical techniques, postoperative care and effect evaluation . I hope to bring some useful information for clinicians to further guide clinical work. 展开更多
关键词 UNILATERAL CLEFT lip NASAL DEFORMITY treatment methods effect evaluation research progress
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Scratch-concerned yield modeling for IC manufacturing involved with a chemical mechanical polishing process 被引量:1
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作者 Jiao-jiao ZHU xiao-hua luo +2 位作者 Li-sheng CHEN Yi YE Xiao-lang YAN 《Journal of Zhejiang University-Science C(Computers and Electronics)》 SCIE EI 2012年第5期376-384,共9页
In existing integrated circuit (IC) fabrication methods,the yield is typically limited by defects generated in the manufacturing process.In fact,the yield often shows a good correlation with the type and density of th... In existing integrated circuit (IC) fabrication methods,the yield is typically limited by defects generated in the manufacturing process.In fact,the yield often shows a good correlation with the type and density of the defect.As a result,an accurate defect limited yield model is essential for accurate correlation analysis and yield prediction.Since real defects exhibit a great variety of shapes,to ensure the accuracy of yield prediction,it is necessary to select the most appropriate defect model and to extract the critical area based on the defect model.Considering the realistic outline of scratches introduced by the chemical mechanical polishing (CMP) process,we propose a novel scratch-concerned yield model.A linear model is introduced to model scratches.Based on the linear model,the related critical area extraction algorithm and defect density distribution are discussed.Owing to higher correspondence with the realistic outline of scratches,the linear defect model enables a more accurate yield prediction caused by scratches and results in a more accurate total product yield prediction as compared to the traditional circular model. 展开更多
关键词 Chemical mechanical polishing (CMP) SCRATCH DEFECT Yield model Critical area
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A new via chain design method considering confidence level and estimation precision
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作者 xiao-hua luo Li-sheng CHEN +1 位作者 Jiao-jiao ZHU Xiao-lang YAN 《Journal of Zhejiang University-Science C(Computers and Electronics)》 SCIE EI 2012年第9期702-710,共9页
For accurate prediction of via yield, via chains are usually fabricated on test chips to investigate issues about vias. To minimize the randomness of experiments and make the testing results more convincing, the confi... For accurate prediction of via yield, via chains are usually fabricated on test chips to investigate issues about vias. To minimize the randomness of experiments and make the testing results more convincing, the confidence level and estimation precision of the via failure rate are investigated in this paper. Based on the Poisson yield model, the method of determining an adequate number of total vias is obtained using the law of large numbers and the de Moivre-Laplace theorem. Moreover, for a specific confidence level and estimation precision, the method of determining a suitable via chain length is proposed. For area minimization, an optimal combination of total vias and via chain length is further determined. Monte Carlo simulation results show that the method is in good accordance with theoretical analyses. Results of via failure rates measured on test chips also reveal that via chains designed using the proposed method has a better performance. In addition, the proposed methodology can be extended to investigate statistical significance for other failure modes. 展开更多
关键词 估计精度 置信水平 设计方法 链长度 拉普拉斯定理 导通孔 产量模型 最佳组合
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Paraplegia as Manifestation of an Isolated Central Nervous System Relapse Following AIIogeneic Hematopoietic Stem Cell Transplantation in a Woman with Acute Myelogenous Leukemia 被引量:1
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作者 Bi-Hui Yang Yan Zhu +4 位作者 Juan Du Yu-Lin Zhang Sha Li Lin Liu xiao-hua luo 《Chinese Medical Journal》 SCIE CAS CSCD 2016年第18期2260-2261,共2页
To the Editor: Allogeneic hematopoietic siena cell transplantation (aLIo-HSCT) is a curative therapy for patients with acute myelogenous letikemia (A M L) due to the intensive conditioning chemoradiotherapy and t... To the Editor: Allogeneic hematopoietic siena cell transplantation (aLIo-HSCT) is a curative therapy for patients with acute myelogenous letikemia (A M L) due to the intensive conditioning chemoradiotherapy and the effect of graft-versus-leukemia (GVL). An isolated extramedullary (EM) relapse of acute leukemia (AL) is a rare occurrence observed more commonly after allo-HSCT rather than following convemional chemotherapy alone. 展开更多
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Novel serpentine structure design method considering confidence level and estimation precision
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作者 Li-sheng CHEN xiao-hua luo +2 位作者 Jiao-jiao ZHU Fan-chao JIE Xiao-lang YAN 《Journal of Zhejiang University-Science C(Computers and Electronics)》 SCIE EI 2013年第3期222-234,共13页
Due to the importance of metal layers in the product yield,serpentine test structures are usually fabricated on test chips to extract parameters for yield prediction.In this paper,the confidence level and estimation p... Due to the importance of metal layers in the product yield,serpentine test structures are usually fabricated on test chips to extract parameters for yield prediction.In this paper,the confidence level and estimation precision of the average defect density on metal layers are investigated to minimize the randomness of experimental results and make the measured parameters more convincing.On the basis of the Poisson yield model,the method to determine the total area of all serpentine test structures is obtained using the law of large numbers and the Lindeberg-Levy theorem.Furthermore,the method to determine an adequate area of each serpentine test structure is proposed under a specific requirement of confidence level and estimation precision.The results of Monte Carlo simulation show that the proposed method is consistent with theoretical analyses.It is also revealed by wafer experimental results that the method of designing serpentine test structure proposed in this paper has better performance. 展开更多
关键词 Poisson yield model Serpentine test structure Critical area Average defect density Confidence level Estimation precision
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