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Corrigendum to“Numerical studies of atomic three-step photoionization processes with non-monochromatic”
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作者 卢肖勇 王立德 李云飞 《Chinese Physics B》 SCIE EI CAS CSCD 2024年第6期628-628,共1页
The Eq.(6)about the time correlation function of the chaotic field model is corrected,along with the corresponding statement.The enlargement factors of ρ_(33,B) and ρ_(ion,B) in the legends of Figs.2(b),2(c)and 2(d)... The Eq.(6)about the time correlation function of the chaotic field model is corrected,along with the corresponding statement.The enlargement factors of ρ_(33,B) and ρ_(ion,B) in the legends of Figs.2(b),2(c)and 2(d)are corrected.These corrections do not affect the conclusions of the work[Chin.Phys.B 31063203(2022)]. 展开更多
关键词 CORRIGENDUM non-monochromatic laserfield chaoticfield model
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Direct simulation Monte Carlo study of metal evaporation with collimator in e-beam physical vapor deposition
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作者 xiaoyong lu Junjie Chai 《Chinese Physics B》 SCIE EI CAS CSCD 2019年第7期299-304,共6页
The flow properties and substrate deposition rate profile, which are the important parameters in electron beam physical vapor deposition, are investigated computationally in this article.Collimators are used to achiev... The flow properties and substrate deposition rate profile, which are the important parameters in electron beam physical vapor deposition, are investigated computationally in this article.Collimators are used to achieve the desired vapor beam and deposition rate profile in some applications.This increases the difficulty measuring boundary conditions and the size of the liquid metal pool inside the collimators.It is accordingly hard to obtain accurate results from numerical calculations.In this article, two-dimensional direct simulation Monte Carlo(DSMC) codes are executed to quantify the influence of uncertainties of boundary conditions and pool sizes.Then, three-dimensional DSMC simulations are established to simulate cerium and neodymium evaporation with the collimator.Experimental and computational results of substrate deposition rate profile are in excellent agreement at various evaporation rates and substrate heights.The results show that the DSMC method can assist in metal evaporation with a collimator. 展开更多
关键词 METAL EVAPORATION COLLIMATOR DEPOSITION thickness PROFILE
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Numerical simulation of metal evaporation based on the kinetic model equation and the direct simulation Monte Carlo method
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作者 xiaoyong lu Xiaozhang Zhang1 Zhizhong Zhang 《Chinese Physics B》 SCIE EI CAS CSCD 2018年第12期361-367,共7页
Metal evaporation on the basis of the kinetic model equations(BGK and S-model) and the direct simulation Monte Carlo(DSMC) method was investigated computationally under the circumstances of collimators existing or not... Metal evaporation on the basis of the kinetic model equations(BGK and S-model) and the direct simulation Monte Carlo(DSMC) method was investigated computationally under the circumstances of collimators existing or not. Numerical data of distributions of number density, bulk velocity and temperature were reported over a wide range of evaporation rate.It was shown that these results reached a good agreement for the case of small evaporation rate, while the deviations became increasingly obvious with the increase of evaporation rate, especially when the collimators existed. Moreover, the deposition thickness over substrate obtained from the kinetic model equations were inaccurate even though the evaporation rate was small. All of the comparisons showed the reliability of the kinetic model equations, which require less computational cost at small evaporation rate and simple structure. 展开更多
关键词 kinetic model equations DSMC metal evaporation COLLIMATORS
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