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Resistive switching characteristics of Dy_2O_3 film with a Pt nanocrystal embedding layer formed by pulsed laser deposition 被引量:3
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作者 Hong-Bin Zhao Hai-Ling Tu +3 位作者 Feng Wei xin-qiang zhang Yu-Hua Xiong Jun Du 《Rare Metals》 SCIE EI CAS CSCD 2014年第1期75-79,共5页
Resistive switching (RS) behaviors of Dy2O3- based memory devices with and without Pt nanocrystals (Pt-nc) layer were investigated for nonvolatile memory applications. The Cu/Pt-nc/Dy2O3/Pt memory exhibits excelle... Resistive switching (RS) behaviors of Dy2O3- based memory devices with and without Pt nanocrystals (Pt-nc) layer were investigated for nonvolatile memory applications. The Cu/Pt-nc/Dy2O3/Pt memory exhibits excellent unipolar RS characteristics, including highly uniform switching parameters, lower switching voltage (〈1.2 V), high resistance ratio (〉1 × 104), a large number of switching cycles, as well as long retention time (〉1 × 105 s), owing to the local electric field confined and strengthened near the nanocrystals' location. 展开更多
关键词 Dy2O3 Unipolar resistive switching Pt nanocrystal layer Pulsed laser deposition
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Energy band alignment of HfO2 on p-type(100)InP
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作者 Meng-Meng Yang Hai-Ling Tu +4 位作者 Jun Du Feng Wei Yu-Hua Xiong Hong-Bin Zhao xin-qiang zhang 《Rare Metals》 SCIE EI CAS CSCD 2017年第3期198-201,共4页
The band alignment of HfO2 film on p-type (100) InP substrate grown by magnetron sputtering was investigated.The chemical states and bonding characteristics of the system were characterized by X-ray photoelectron sp... The band alignment of HfO2 film on p-type (100) InP substrate grown by magnetron sputtering was investigated.The chemical states and bonding characteristics of the system were characterized by X-ray photoelectron spectroscopy (XPS).The results show that there is no existence of Hf-P or Hf-In and there are interfacial In2O3 and InPO4 at the interface.Ultraviolet spectrophotometer (UVS) was employed to obtain the band gap value of HfO2.In 3d and Hf 4f core-level spectra and valence spectra were employed to obtain the valence band offset of HfO2/InP.Experimental results show that the (5.88 ± 0.05) eV band gap of HfO2 is aligned to the band gap of InP with a conduction band offset (△Ec) of (2.74 ± 0.05) eV and a valence band offset (△Ev) of (1.80 ± 0.05) eV.Compared with HfO2 on Si,HfO2 on InP exhibits a much larger conduction band offset (1.35 eV larger),which is beneficial to suppress the tunneling leakage current. 展开更多
关键词 Band alignment HFO2 INP Large conductionband offset
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