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Recent development and application of thin-film thermoelectric cooler 被引量:4
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作者 Yuedong Yu Wei Zhu +3 位作者 xixia kong Yaling Wang Pengcheng Zhu Yuan Deng 《Frontiers of Chemical Science and Engineering》 SCIE EI CAS CSCD 2020年第4期492-503,共12页
Recently,the performance and fabrication of thin-ilm thermoeletric materials have been jargely enhanced.Based on this enhancement,the thin-film thermoelectric cooler(TEC)is becoming a research hot topic,due to its hig... Recently,the performance and fabrication of thin-ilm thermoeletric materials have been jargely enhanced.Based on this enhancement,the thin-film thermoelectric cooler(TEC)is becoming a research hot topic,due to its high cooling flux and microchip level size.To fulfill a thin-film TEC,interfacial problems are unavoidable,as they may largely reduce the properties of a thin-film TEC.Moreover,the architecture of a thin-film TEC should also be properly designed.In this review,we introduced the enhancement of thermoelectric properties of(Bi,Sb)2(Te,Se)3 solid solution materials by chemical vapor deposition,physical vapor deposition and electro-deposition.Then,the interfacial problems,including contact resistance,interfacial diffusion and thermal contact resistance,were discussed.Furthermore,the design,fabrication,as well as the performance of thin-film TECs were summarized. 展开更多
关键词 thin-film thermoelectric cooler INTERFACES cooling flux TE device fabrication
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