Metal patterning from a modified tannic acid(TA-Boc-MA)photoresist and the processes are designed using protection of hydroxyl groups in tannic acid,formulation into a photoresist,an exposure and pattern treatment pro...Metal patterning from a modified tannic acid(TA-Boc-MA)photoresist and the processes are designed using protection of hydroxyl groups in tannic acid,formulation into a photoresist,an exposure and pattern treatment process,and metallization by electroless Ag deposition with silver ion solution.展开更多
基金supported by the Special Fund for Key Research Project of Shandong Province of China(No.2019JZZY020229).
文摘Metal patterning from a modified tannic acid(TA-Boc-MA)photoresist and the processes are designed using protection of hydroxyl groups in tannic acid,formulation into a photoresist,an exposure and pattern treatment process,and metallization by electroless Ag deposition with silver ion solution.
