In this study,we report the annealing effects on the physical properties of Sn_3Sb_2S_6 thin films.Sn_3Sb_2S_6 thin films were prepared onto non-heated glass substrates via thermal evaporation technique.The as-deposit...In this study,we report the annealing effects on the physical properties of Sn_3Sb_2S_6 thin films.Sn_3Sb_2S_6 thin films were prepared onto non-heated glass substrates via thermal evaporation technique.The as-deposited films were annealed in air for 1 h in the temperature range from 100 to 300 °C.X-ray diffraction results show that the crystallinity of the thin films increased after annealing.The microstructure parameters crystallite size,dislocation density,lattice strain and stacking fault probability were calculated.The optical properties were obtained from the analysis of the experimental recorded transmittance and reflectance spectral data over the wavelength range 300–1800 nm.High absorption coefficient（10~5cm^（-1）） reached to the visible and near-IR spectral range.A decrease in optical band gap from 1.92 to 1.71 e V by increasing the air annealing temperature was observed.Oscillator energy E_o and dispersion energy E_d of the films after annealing were estimated according to the model of Wemple–Di Domenico single oscillator.Spitzer–Fan model was applied to determine the electron free carrier susceptibility and the ratio of carrier concentration to the effective mass.The layers annealed at temperatures 〉150 ℃ undergo abrupt changes in their electrical properties and exhibit a resistive hysteresis behavior.These properties confer to the material interest perspectives for its application in diverse advanced technologies such as photovoltaic applications and optical storage.展开更多
文摘In this study,we report the annealing effects on the physical properties of Sn_3Sb_2S_6 thin films.Sn_3Sb_2S_6 thin films were prepared onto non-heated glass substrates via thermal evaporation technique.The as-deposited films were annealed in air for 1 h in the temperature range from 100 to 300 °C.X-ray diffraction results show that the crystallinity of the thin films increased after annealing.The microstructure parameters crystallite size,dislocation density,lattice strain and stacking fault probability were calculated.The optical properties were obtained from the analysis of the experimental recorded transmittance and reflectance spectral data over the wavelength range 300–1800 nm.High absorption coefficient（10~5cm^（-1）） reached to the visible and near-IR spectral range.A decrease in optical band gap from 1.92 to 1.71 e V by increasing the air annealing temperature was observed.Oscillator energy E_o and dispersion energy E_d of the films after annealing were estimated according to the model of Wemple–Di Domenico single oscillator.Spitzer–Fan model was applied to determine the electron free carrier susceptibility and the ratio of carrier concentration to the effective mass.The layers annealed at temperatures 〉150 ℃ undergo abrupt changes in their electrical properties and exhibit a resistive hysteresis behavior.These properties confer to the material interest perspectives for its application in diverse advanced technologies such as photovoltaic applications and optical storage.
