Si-rich SiO_(2) films were deposited by plasma-enhanced chemical vapor deposition on the silicon substrates,and then implanted with 1×10^(15)cm^(-2) 400 keV Er ions.After annealing at 800℃ for 5 min,the samples ...Si-rich SiO_(2) films were deposited by plasma-enhanced chemical vapor deposition on the silicon substrates,and then implanted with 1×10^(15)cm^(-2) 400 keV Er ions.After annealing at 800℃ for 5 min,the samples show room temperature luminescence around 1.54μm,characteristic of intra-4f emission from Er^(3+),upon excitation using an Ar ion laser.展开更多
文摘Si-rich SiO_(2) films were deposited by plasma-enhanced chemical vapor deposition on the silicon substrates,and then implanted with 1×10^(15)cm^(-2) 400 keV Er ions.After annealing at 800℃ for 5 min,the samples show room temperature luminescence around 1.54μm,characteristic of intra-4f emission from Er^(3+),upon excitation using an Ar ion laser.
