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Oxygen vacancy induced carrier mobility enhancement in nano-multilayered ZrO_(2):Y_(2)O_(3)/SrTiO_(3)thin films for non-volatile memory devices
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作者 yang ze-ou HUANG Xiao-zhong +3 位作者 HU Hai-long MA Bing-yang SHANG Hai-long YUE Jian-ling 《Journal of Central South University》 SCIE EI CAS CSCD 2024年第10期3674-3687,共14页
The influence of oxygen vacancy-dominated carrier mobility on the performance of memristors has attractedconsiderable attention.The device’s carrier mobility can be significantly improved by forming a nano-multilayer... The influence of oxygen vacancy-dominated carrier mobility on the performance of memristors has attractedconsiderable attention.The device’s carrier mobility can be significantly improved by forming a nano-multilayeredheterostructure when the individual layer thickness is below a critical value.In this work,Pt/[ZrO_(2):Y_(2)O_(3)(YSZ)/SrTiO_(3)(STO)]n/Nb:SrTiO_(3)(NSTO)memristive devices were configurated through laser pulse deposited YSZ/STO nanomultilayeredactive layer with both Pt and NSTO acting as top and counter electrodes.Specifically,the Pt/[YSZ/STO]5/NSTO device with five consecutive layers of YSZ/STO thin film shows superior memristor performance,and itscorresponding carrier mobility presents a significantly enhanced value compared to that of other periodic numbers ofYSZ/STO composed memristive devices.This can be attributed to the increase of oxygen vacancy concentration in thedevice,as evidenced by both experimental results and theoretical analysis.This work provides a significant approach inimproving the performance of memristor dominated by oxygen vacancy transporting mechanism. 展开更多
关键词 YSZ/STO nano-multilayered thin film MEMRISTOR oxygen vacancy carrier mobility
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