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Photoluminescence from neodymium silicide thin films formed by MEVVA ion source
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作者 XIAO Zhi-Song XU Fei +3 位作者 CHENG Guo-An ZHANG Tong-He yi zhong-zhen wang shui-feng (key laboratory in university for radiation beam technology and materials modification, institute of low energy nuclear physics, beijing normal university beijing radiation 《Nuclear Science and Techniques》 SCIE CAS CSCD 2001年第1期21-23,共3页
Neodymium silicides were synthesized by Nd ion implant6d into Si substrates with the aid of a metal vapor vacuum arc (MEVVA) ion source. The blender of Nd5Si4 and NdSi2 was formed in a neodymium-implanted silicon thin... Neodymium silicides were synthesized by Nd ion implant6d into Si substrates with the aid of a metal vapor vacuum arc (MEVVA) ion source. The blender of Nd5Si4 and NdSi2 was formed in a neodymium-implanted silicon thin film during the as-implanted state, but there was only single neodymium silicide compound in the postannealed state, and the phase changed from NdSi2 to Nd5Si4 with increasing annealing temperature. The blue-violet luminescence excited by ultra-violet was observed at the room temperature (RT), and the intensity of photoluminescence (PL) increased with increasing the neodymium ion fluence. Moreover, the photoluminescence was closely dependent on the temperature of rapid thermal annealing (RTA). A mechanism of photoluminescence was discussed. 展开更多
关键词 MEVVA离子源 离子移殖 薄膜 光致发光
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