The effect of coil location on wafer temperature is analyzed in a vertical MOCVD reactor by induction heating.It is observed that the temperature distribution in the wafer with the coils under the graphite susceptor i...The effect of coil location on wafer temperature is analyzed in a vertical MOCVD reactor by induction heating.It is observed that the temperature distribution in the wafer with the coils under the graphite susceptor is more uniform than that with the coils around the outside wall of the reactor.For the case of coils under the susceptor,we find that the thickness of the susceptor,the distance from the coils to the susceptor bottom and the coil turns significantly affect the temperature uniformity of the wafer.An optimization process is executed for a 3-inch susceptor with this kind of structure,resulting in a large improvement in the temperature uniformity.A further optimization demonstrates that the new susceptor structure is also suitable for either multiple wafers or large-sized wafers approaching 6 and 8 inches.展开更多
基金Supported by the National Natural Science Foundation of China under Grant Nos 60736033 and 60506020.
文摘The effect of coil location on wafer temperature is analyzed in a vertical MOCVD reactor by induction heating.It is observed that the temperature distribution in the wafer with the coils under the graphite susceptor is more uniform than that with the coils around the outside wall of the reactor.For the case of coils under the susceptor,we find that the thickness of the susceptor,the distance from the coils to the susceptor bottom and the coil turns significantly affect the temperature uniformity of the wafer.An optimization process is executed for a 3-inch susceptor with this kind of structure,resulting in a large improvement in the temperature uniformity.A further optimization demonstrates that the new susceptor structure is also suitable for either multiple wafers or large-sized wafers approaching 6 and 8 inches.
