AlGaN/GaN high electron mobility transistors(HEMTs)are grown on 2-inch Si(111)substrates by MOCVD.The stacked AlGaN/AlN interlayer with different AlGaN thickness and indium surfactant doped is designed and optimized t...AlGaN/GaN high electron mobility transistors(HEMTs)are grown on 2-inch Si(111)substrates by MOCVD.The stacked AlGaN/AlN interlayer with different AlGaN thickness and indium surfactant doped is designed and optimized to relieve the tensile stress during GaN epitaxial growth.The top 1.0μm GaN buffer layer grown on the optimized AlGaN/AlN interlayer shows a crack-free and shining surface.The XRD results show that GaN(002)FWHM is 480arcsec and GaN(102)FWHM is 900arcsec.The AGaN/GaN HEMTs with optimized and nonoptimized AlGaN/AlN interlayer are grown and processed for comparison and the dc and rf characteristics are characterized.For the dc characteristics of the device with optimized AlGaN/AlN interlayer,maximum drain current density I_(dss)of 737mA/mm,peak transconductance G_(m)of 185mS/mm,drain leakage current density Ids of 1.7μA/mm,gate leakage current density I_(gs)of 24.8μA/mm and off-state breakdown voltage VBR of 67V are achieved with L_(g)/W_(g)/L_(g)/L_(g)=1/10/1/1μm.For the small signal rf characteristics of the device with optimized AlGaN/AlN interlayer,current gain cutoff frequency fT of 8.3 GHz and power gain cutoff frequency fmax of 19.9GHz are achieved with L_(g)/W_(g)/L_(g)/L_(g)=1/100/1/1μm.Furthermore,the best rf performance with fT of 14.5 GHz and fmax of 37.3 GHz is achieved with a reduced gate length of 0.7μm.展开更多
The reaction of tricyanometallate precursor, Bu_4N[Fe(Tp)(CN)_3] and(Bu_4N)[(pzTp)Fe(CN)_3](Tp = tris(pyrazolyl)hydroborate, pzTp = tetrakis(pyrazolyl)borate) with Ni(ClO_4).26 H_2O in the presence of the monodentate ...The reaction of tricyanometallate precursor, Bu_4N[Fe(Tp)(CN)_3] and(Bu_4N)[(pzTp)Fe(CN)_3](Tp = tris(pyrazolyl)hydroborate, pzTp = tetrakis(pyrazolyl)borate) with Ni(ClO_4).26 H_2O in the presence of the monodentate N-methylimidazole ligand afforded two new cyano-bridged heterobimetallic {Fe2 Ni} trinuclear clusters, {[Fe(Tp)(CN)_3]_2[Ni(Mim)_4]}·8 H_2O(1) and {[Fe(pzTp)(CN)_3]_2[Ni(Mim)_4]}·2 CH_3OH·2H_2O(2). The molecular structure was determined by single-crystal X-ray diffraction. In the two compounds, the FeIII ions were coordinated by three cyanide carbon atoms and three nitrogen atoms of Tp(or pzTp) anions, whereas, the NiII ions were surrounded by two cyanide nitrogen atoms and four nitrogen atoms from four monodentate N-methylimidazole ligands, and they were bridged by tricyanometalate building block to form similar {Fe2Ni} trinuclear clusters. Cyclic voltammetry(CV) measurements indicated that compound 1 exhibited two quasireversible iron-centered reduction processes at –0.71 and –0.17 V and one quasireversible nickel-centered oxidation process at 0.92 V, while compound 2 showed two quasireversible iron-centered reduction processes at –0.66 and –0.09 V and one quasireversible nickel-centered oxidation process at 0.88 V. Magnetic measurements showed that compounds 1 and 2 exhibited strong intrachain ferromagnetic interaction between the low-spin Fe~Ⅲ(S = 1/2) and high-spin Ni~Ⅱ(S = 1) ions.展开更多
文摘AlGaN/GaN high electron mobility transistors(HEMTs)are grown on 2-inch Si(111)substrates by MOCVD.The stacked AlGaN/AlN interlayer with different AlGaN thickness and indium surfactant doped is designed and optimized to relieve the tensile stress during GaN epitaxial growth.The top 1.0μm GaN buffer layer grown on the optimized AlGaN/AlN interlayer shows a crack-free and shining surface.The XRD results show that GaN(002)FWHM is 480arcsec and GaN(102)FWHM is 900arcsec.The AGaN/GaN HEMTs with optimized and nonoptimized AlGaN/AlN interlayer are grown and processed for comparison and the dc and rf characteristics are characterized.For the dc characteristics of the device with optimized AlGaN/AlN interlayer,maximum drain current density I_(dss)of 737mA/mm,peak transconductance G_(m)of 185mS/mm,drain leakage current density Ids of 1.7μA/mm,gate leakage current density I_(gs)of 24.8μA/mm and off-state breakdown voltage VBR of 67V are achieved with L_(g)/W_(g)/L_(g)/L_(g)=1/10/1/1μm.For the small signal rf characteristics of the device with optimized AlGaN/AlN interlayer,current gain cutoff frequency fT of 8.3 GHz and power gain cutoff frequency fmax of 19.9GHz are achieved with L_(g)/W_(g)/L_(g)/L_(g)=1/100/1/1μm.Furthermore,the best rf performance with fT of 14.5 GHz and fmax of 37.3 GHz is achieved with a reduced gate length of 0.7μm.
基金partly supported by the NNSFC(Nos.21301023,21501021,11474045)the 2014 Program for Liaoning Excellent Talents in University(No.LJQ2014138)+2 种基金the Program for Dalian Excellent Talents(No.2017RQ148)the Fundamental Research Funds for the Central Universities(wd01157)the 2017 Training Program of Innovation and Entrepreneurship for Undergraduates in Dalian Minzu University(201712026150 and 201812026150)
文摘The reaction of tricyanometallate precursor, Bu_4N[Fe(Tp)(CN)_3] and(Bu_4N)[(pzTp)Fe(CN)_3](Tp = tris(pyrazolyl)hydroborate, pzTp = tetrakis(pyrazolyl)borate) with Ni(ClO_4).26 H_2O in the presence of the monodentate N-methylimidazole ligand afforded two new cyano-bridged heterobimetallic {Fe2 Ni} trinuclear clusters, {[Fe(Tp)(CN)_3]_2[Ni(Mim)_4]}·8 H_2O(1) and {[Fe(pzTp)(CN)_3]_2[Ni(Mim)_4]}·2 CH_3OH·2H_2O(2). The molecular structure was determined by single-crystal X-ray diffraction. In the two compounds, the FeIII ions were coordinated by three cyanide carbon atoms and three nitrogen atoms of Tp(or pzTp) anions, whereas, the NiII ions were surrounded by two cyanide nitrogen atoms and four nitrogen atoms from four monodentate N-methylimidazole ligands, and they were bridged by tricyanometalate building block to form similar {Fe2Ni} trinuclear clusters. Cyclic voltammetry(CV) measurements indicated that compound 1 exhibited two quasireversible iron-centered reduction processes at –0.71 and –0.17 V and one quasireversible nickel-centered oxidation process at 0.92 V, while compound 2 showed two quasireversible iron-centered reduction processes at –0.66 and –0.09 V and one quasireversible nickel-centered oxidation process at 0.88 V. Magnetic measurements showed that compounds 1 and 2 exhibited strong intrachain ferromagnetic interaction between the low-spin Fe~Ⅲ(S = 1/2) and high-spin Ni~Ⅱ(S = 1) ions.